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Complementary resistive switches for passive nanocrossbar memories
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Conductive bridging RAM (CBRAM): An emerging non-volatile memory technology scalable to sub 20nm
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M. Kund, G. Beitel, C.-U. Pinnow, T. Röhr, J. Schumann, R. Symanczyk, K.-D. Ufert, and G. Müller, "Conductive bridging RAM (CBRAM): An emerging non-volatile memory technology scalable to sub 20 nm," in IEDM Tech. Dig., 2005, pp. 754-757. (Pubitemid 46370960)
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Integrated complementary resistive switches for passive high-density nanocrossbar arrays
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Diode-less nano-scale ZrOx/HfOx RRAM device with excellent switching uniformity and reliability for high-density crosspoint memory applications
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J. Lee, J. Shin, D. Lee, W. Lee, S. Jung, M. Jo, J. Park, K. P. Biju, S. Kim, S. Park, and H. Hwang, "Diode-less nano-scale ZrOx/HfOx RRAM device with excellent switching uniformity and reliability for high-density crosspoint memory applications," in 2011 IEDM Tech. Dig., pp. 19.5.1-19.5.4.
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A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5?x/TaO2?x bilayer structures
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Jul.
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M.-J. Lee, C. B. Lee, D. Lee, S. R. Lee, M. Chang, J. H. Hur, Y.-B. Kim, C.-J. Kim, D. H. Seo, S. Seo, U.-I. Chung, I.-K. Yoo, and K. Kim, "A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5?x/TaO2?x bilayer structures," Nature Mater., vol. 10, no. 8, pp. 625-630, Jul. 2011.
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Nanoscale bipolar and complementary resistive switching memory based on amorphous carbon
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Nov
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Y. Chai, Y. Wu, K. Takei, H.-Y. Chen, S. Yu, C. H. Chan, A. Javey, and H.-S. P. Wong, "Nanoscale bipolar and complementary resistive switching memory based on amorphous carbon," IEEE Trans. Electron Devices, vol. 58, no. 11, pp. 3933-3939, Nov. 2011.
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Chai, Y.1
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84859214431
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10 × 10 nm2 Hf/HfOx crossbar resistive ram with excellent performance, reliability and low-energy operation
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B. Govoreanu, G. S. Kar, Y.-Y. Chen, V. Paraschiv, S. Kubicek, A. Fantini, I. P. Radu, L. Goux, S. Clima, R. Degraeve, N. Jossart, O. Richard, T. Vandeweyer, K. Seo, P. Hendrickx, G. Pourtois, H. Bender, L. Altimime, D. J. Wouters, J. A. Kittl, and M. Jurczak, "10 × 10 nm2 Hf/HfOx crossbar resistive ram with excellent performance, reliability and low-energy operation," in IEDM Tech. Dig., 2011, pp. 31.6.1-31.6.4.
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IEDM Tech. Dig.
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8
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Intrinsic switching behavior in HfO2 RRAM by fast electrical measurements on novel 2R test structures
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May to be published
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A. Fantini, D. J. Wouters, R. Degraeve, L. Goux, L. Pantisano1, G. Kar, Y.-Y. Chen, B. Govoreanu, J. A. Kittl, L. Altimime, and M. Jurczak, "Intrinsic switching behavior in HfO2 RRAM by fast electrical measurements on novel 2R test structures," in Proc. 4th IEEE Int. Memory Workshop, May 20-23, 2012, to be published.
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Proc. 4th IEEE Int. Memory Workshop
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Fantini, A.1
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9
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84857013128
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Filamentary-switching model RRAM for time, energy and scaling projections
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D. Ielmini, "Filamentary-switching model RRAM for time, energy and scaling projections," in IEDM Tech. Dig., 2011, pp. 17.2.1-17.2.4.
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IEDM Tech. Dig.
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Ielmini, D.1
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