SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 539, Issue , 2013, Pages 145-150

Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline palladium thin films

(8) Amin Ahmadi, B a Idrissi, H a Galceran, M b Colla, M S c Raskin, J P c Pardoen, T c Godet, S b Schryvers, D a

a UNIVERSITY OF ANTWERP (Belgium)

b UNIVERSITÉ LIBRE DE BRUXELLES (Belgium)

c UNIVERSITÉ CATHOLIQUE DE LOUVAIN (Belgium)

Author keywords

Deposition rate; Grain boundary; Palladium; Texture; Thin film; Twin boundary

Indexed keywords

CRYSTALLOGRAPHIC ORIENTATIONS; CRYSTALLOGRAPHIC TEXTURES; DISLOCATION DENSITIES; ELECTRON BEAM EVAPORATION; GRAIN BOUNDARY CHARACTER; HIGH ANGLE GRAIN BOUNDARIES; NANOCRYSTALLINE PALLADIUM; TWIN BOUNDARIES;

DEPOSITION RATES; ELECTRON BEAMS; GRAIN BOUNDARIES; PALLADIUM; SINGLE CRYSTALS; TEXTURES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

DEPOSITION;

EID: 84879416199 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.05.083 Document Type: Article

Times cited : (23)

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