SCOPUS 정보 검색 플랫폼

JOM

Volumn 63, Issue 9, 2011, Pages 62-66

In-situ TEM study of dislocation-twin boundaries interaction in nanotwinned Cu films

(4) Li, N a Wang, J a Zhang, X b Misra, A a

a LOS ALAMOS NATIONAL LABORATORY (United States)

b Department of Electrical and Computer Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENGINEERING; MATERIALS SCIENCE;

DEFORMATION BEHAVIOR; EPITAXIAL THIN FILMS; FACE-CENTERED CUBIC METALS; HIGH ELECTRICAL CONDUCTIVITY; INCOHERENT TWIN; STRESS-INDUCED MIGRATION; TWIN BOUNDARIES; TWINNING DISLOCATIONS;

TRANSMISSION ELECTRON MICROSCOPY;

EID: 80052947752 PISSN: 10474838 EISSN: 15431851 Source Type: Journal
DOI: 10.1007/s11837-011-0160-9 Document Type: Article

Times cited : (46)

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