Ultrahigh strain hardening in thin palladium films with nanoscale twins

Advanced Materials

Volumn 23, Issue 18, 2011, Pages 2119-2122

  Idrissi, Hosni ^a   Wang, Binjie ^a   Colla, Marie Stéphane ^b   Raskin, Jean Pierre ^b   Schryvers, Dominique ^a   Pardoen, Thomas ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

nanomechanical testing; nanotwins; palladium; strain hardening; thin films

Indexed keywords

COHERENT GROWTH; NANO-SCALE TWINS; NANOCRYSTALLINES; NANOMECHANICAL TESTING; NANOTWINS; ON CHIPS; PALLADIUM FILMS; PD FILM; PD THIN FILMS; TWIN BOUNDARIES; WORK HARDENING;

MEMBRANE TECHNOLOGY; PLASTICITY; STRAIN HARDENING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

MECHANICAL TESTING;

METAL NANOPARTICLE; PALLADIUM;

ARTICLE; CHEMISTRY; MECHANICAL STRESS; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE;

METAL NANOPARTICLES; NANOTECHNOLOGY; PALLADIUM; PARTICLE SIZE; STRESS, MECHANICAL;

EID: 79955624789     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201004160     Document Type: Article

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