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Volumn 19, Issue 4-6, 2013, Pages 111-116

Atomic layer deposition of LiF thin films from Lithd and TiF4 precursors

Author keywords

Atomic layer deposition; Lithium fluoride; Thin films

Indexed keywords

DEPOSITION METHODS; DEPOSITION PROCESS; DEPOSITION TEMPERATURES; ELASTIC RECOIL DETECTION ANALYSIS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; LITHIUM FLUORIDE; LOW REFRACTIVE INDEX; UV-VIS SPECTROMETRY;

EID: 84879230989     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201207026     Document Type: Article
Times cited : (34)

References (35)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.