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Volumn 7, Issue 2, 1997, Pages 159-170

Reactive gas magnetron sputtering of lithium hydride and lithium fluoride thin films

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; FLUORESCENCE; HYDRIDES; LITHIUM COMPOUNDS; MAGNETRON SPUTTERING; MIRRORS; MORPHOLOGY; MULTILAYERS; SURFACE ROUGHNESS; THIN FILMS; ULTRAVIOLET SPECTROMETERS; X RAYS;

EID: 0031163092     PISSN: 08953996     EISSN: None     Source Type: Journal    
DOI: 10.1006/jxra.1997.0258     Document Type: Article
Times cited : (11)

References (18)
  • 1
    • 0029393016 scopus 로고
    • U. Kleineberg et al., Appl. Opt. 34(28), 6506 (1995).
    • (1995) Appl. Opt. , vol.34 , Issue.28 , pp. 6506
    • Kleineberg, U.1
  • 3
    • 36549095916 scopus 로고
    • V. Dupuis et al., J. Appl. Phys. 68(10), 5146 (1990).
    • (1990) J. Appl. Phys. , vol.68 , Issue.10 , pp. 5146
    • Dupuis, V.1
  • 14
    • 85030047585 scopus 로고    scopus 로고
    • D. Field. [Private consultation, TSL TexSEM Laboratories, Provo, UT 84604]
    • D. Field. [Private consultation, TSL TexSEM Laboratories, Provo, UT 84604]


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.