Thin reactive LiF films for nuclear sensors

Thin Solid Films

Volumn 303, Issue 1-2, 1997, Pages 191-195

  Cosset, Françoise ^a   Celerier, Alain ^a   Barelaud, Bruno ^a   Vareille, Jean Claude ^a  

^a Centre National de la Recherche Scientifique   (France)

Author keywords

Deposition process; Lithium fluoride films

Indexed keywords

CRYSTALLIZATION; DEPOSITION; EVAPORATION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LITHIUM COMPOUNDS; MORPHOLOGY; SEMICONDUCTING SILICON; SENSORS; SUBSTRATES; SURFACE STRUCTURE; THERMAL EFFECTS;

LITHIUM FLUORIDE; NUCLEAR SENSORS;

THIN FILMS;

EID: 0031188640     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00070-9     Document Type: Article

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