Effect of fluorocarbon self-assembled monolayer films on sidewall adhesion and friction of surface micromachines with impacting and sliding contact interfaces

Journal of Applied Physics

Volumn 113, Issue 22, 2013, Pages

  Xiang, H ^a   Komvopoulos, K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENVIRONMENTAL CONDITIONS; NANO-SCALE SURFACES; OSCILLATORY SLIDING; REAL AREA OF CONTACT; SELF-ASSEMBLED MONOLAYER FILMS; SI (100) SUBSTRATE; SIDEWALL ADHESION; STRUCTURAL COMPOSITION;

ADHESION; DEPOSITS; HYDROPHOBICITY; INTERFACES (MATERIALS); LOADING; MAGNETIC FILMS; PHOTOELECTRONS; POLYSILICON; SELF ASSEMBLED MONOLAYERS; STICTION; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPOSITE MICROMECHANICS;

EID: 84879229268     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4808099     Document Type: Article

References (24)

1. K. Suzuki, Jpn. J. Appl. Phys. 41 (Part I, No. 6B), 4335 (2002). 10.1143/JJAP.41.4335
2. W. H. Ko and Q. Wang, Sens. Actuators A 75, 242 (1999). 10.1016/S0924-4247(99)00069-2
3. K. Komvopoulos, Wear 200, 305 (1996). 10.1016/S0043-1648(96)07328-0
4. S. J. Timpe and K. Komvopoulos, Appl. Phys. Lett. 90, 093510 (2007). 10.1063/1.2709988
5. G. T. Mulhern, D. S. Soane, and R. T. Howe, in Proceedings of the Seventh International Conference on Solid-State Sensors and Actuators, Transducers '93, Yokohama, Japan, 7-10 June 1993 (IEEE, Piscataway, NJ, 1993), p. 296.
6. R. Maboudian and R. T. Howe, Tribol. Lett. 3, 215 (1997). 10.1023/A:1019185206471
7. W. R. Ashurst, C. Yau, C. Carraro, R. Maboudian, and M. T. Dugger, J. Microelectromech. Syst. 10, 41 (2001). 10.1109/84.911090
8. S. Hozumi, K. Ushiyama, H. Sugimura, and O. Takai, Langmuir 15, 7600 (1999). 10.1021/la9809067
9. W. R. Ashurst, C. Carraro, R. Maboudian, and W. Frey, Sens. Actuators A 104, 213 (2003). 10.1016/S0924-4247(03)00023-2
10. R. Maboudian and C. Carraro, Annu. Rev. Phys. Chem. 55, 35 (2004). 10.1146/annurev.physchem.55.091602.094445
11. R. J. Klein, D. A. Fischer, and J. L. Lenhart, Langmuir 27, 12423 (2011). 10.1021/la202294f
12. T. Kasai, B. Bhushan, G. Kulik, L. Barbieri, and P. Hoffmann, J. Vac. Sci. Technol. B 23, 995 (2005). 10.1116/1.1913674
13. J. Fréchette, R. Maboudian, and C. Carraro, J. Microelectromech. Syst. 15, 737 (2006). 10.1109/JMEMS.2006.878893
14. D. A. Hook, S. J. Timpe, M. T. Dugger, and J. Krim, J. Appl. Phys. 104, 034303 (2008). 10.1063/1.2960567
15. S. J. Timpe and K. Komvopoulos, J. Microelectromech. Syst. 14, 1356 (2005). 10.1109/JMEMS.2005.859076
16. S. J. Timpe and K. Komvopoulos, Rev. Sci. Instrum. 78, 065106 (2007). 10.1063/1.2742648
17. H. Xiang and K. Komvopoulos, J. Appl. Phys. 111, 054507 (2012). 10.1063/1.3688353
18. S. J. Timpe and K. Komvopoulos, J. Microelectromech. Syst. 15, 1612 (2006). 10.1109/JMEMS.2006.885855
19. S. Tajima and K. Komvopoulos, J. Phys. Chem. C 111, 4358 (2007). 10.1021/jp067521e
20. D. H. Alsem, H. Xiang, R. O. Ritchie, and K. Komvopoulos, J. Microelectromech. Syst. 21, 359 (2012). 10.1109/JMEMS.2011.2180364
21. S. J. Timpe, K. Komvopoulos, and M. T. Dugger, J. Appl. Phys. 102, 123503 (2007). 10.1063/1.2818039
22. J. I. Siepmann and I. R. McDonald, Phys. Rev. Lett. 70, 453 (1993). 10.1103/PhysRevLett.70.453
23. M. Garcia-Parajo, C. Longo, J. Servat, P. Gorostiza, and F. Sanz, Langmuir 13, 2333 (1997). 10.1021/la960523d
24. A. Lio, C. Morant, D. F. Ogletree, and M. Salmeron, J. Phys. Chem. B 101, 4767 (1997). 10.1021/jp963807f