Optimizations of pulsed plated p and n-type Bi2Te 3-based ternary compounds by annealing in different ambient atmospheres

Advanced Energy Materials

Volumn 3, Issue 1, 2013, Pages 95-104

  Schumacher, Christian ^a   Reinsberg, Klaus G ^a   Rostek, Raimar ^a   Akinsinde, Lewis ^a   Baessler, Svenja ^a   Zastrow, Sebastian ^a   Rampelberg, Geert ^a   Woias, Peter ^a   Detavernier, Christophe ^a   Broekaert, José A C ^a   Bachmann, Julien ^a   Nielsch, Kornelius ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT ATMOSPHERE; DEPOSITION POTENTIAL; EQUILIBRIUM CONDITIONS; IN-SITU XRD MEASUREMENTS; STAINLESS STEEL SUBSTRATES; TERNARY COMPOUNDS; THERMOELECTRIC PARAMETERS; THERMOELECTRIC PERFORMANCE;

DEPOSITION; DOPING (ADDITIVES); ELECTRIC POWER FACTOR; GOLD DEPOSITS; OPTIMIZATION; PHOSPHORUS; TELLURIUM COMPOUNDS; THERMAL CONDUCTIVITY; THERMOELECTRICITY;

ANNEALING;

EID: 84878868080     PISSN: 16146832     EISSN: 16146840     Source Type: Journal    
DOI: 10.1002/aenm.201200417     Document Type: Article

References (44)

1. M. Sander, R. Gronsky, T. Sands, A. Stacy, Chem. Mater 2003, 15, 335-33-9.
2. E. Menke, M. Brown, Q. Li, J. Hemminger, R. Penner, Langmuir 2006, 22, 10564-1057-4.
3. C. Jin, X. Xiang, C. Jia, W. Liu, W. Cai, L. Yao, X. Li, J. Phys. Chem. B 2004, 108, 184-4.
4. A. Prieto, M. Sander, M. Gonzáles, R. Gronsky, T. Sands, A. Stacy, J. Am. Chem. Soc. 2001, 123, 716-0.
5. F. Li, F. Long, W. Wang, Applied Surface Science 2009, 255, 7394-740-2.
6. A. Bassi, A. Bailini, C. Casari, F. Donati, A. Mantegazza, M. Passoni, V. Russo, C. Bottani, J. Appl. Phys. 2009, 10-5.
7. P. Magri, C. Boulanger, J. Lecuire, J. Mater. Chem. 1996, 6, 773-77-9.
8. S. Li, M. Toprak, H. Soliman, J. Zhou, M. Muhammed, D. Platzek, E. Mueller, Chem. Mater. 2006, 18, 3627-363-3.
9. W. Glatz, E. Schwyter, L. Durrer, C. Hierold, J. Microelectromech. Syst. 2009, 18,-3.
10. W. Glatz, L. Durrer, E. Schwyter, C. Hierold, Electrochim. Acta 2008, 54, 755-76-2.
11. F. Xiao, C. Hangarter, B. Yoo, Y. Rheem, K. Lee, N. Myung, Electrochim. Acta 2008, 53, 8103-811-7.
12. D. Lide, CRC Handbook of Chemistry and Physics, 73 rd Edition, CRC Press Inc . Boca Raton, 1992, 4-10-6.
13. CAS 1309-64-4 Merck Chemicals PDF # 107836, http:/assets. chemportals.merck.de/documents/sds/emd/deu/de/1078/107836. pdf (accessed Novemeber 2011).
14. C. Schumacher, K. Reinsberg, L. Akinsinde, S. Zastrow, S. Heiderich, W. Toellner, G. Rampelberg, C. Detavernier, J. Broekaert, K. Nielsch, J. Bachmann, Adv. Energy Mater. 2011, 2, 3, 345-352 DOI: 10.1002/20110058-5.
15. K. Smirous, L. Stourac, Z Naturforsch. 1959, 14a, 848-84-9.
16. S. Kim, K. Ahn, D. Yeon, S. Hwang, H. Kim, S. Lee, K. Lee, Appl. Phys. Express 2011, 091801, 4, 9, Article Nr.: 091801 DOI 10.1143/APEX.4.09180-1.
17. M. Scheele, N. Oeschler, I. Veremchuk, K. Reinsberg, A. Kreuziger, A. Kornowski, J. Broeckaert, C. Klinke, H. Weller, ACSNano 2010, 4, 7, 4283-429-1.
18. M. Martin-Gonzalez, A. Prieto, R Gronsky, T. Sands, A. Stacy, Adv. Mater. 2003, 15, 100-3.
19. D. Del Frari, S. Diliberto, N. Stein, C. Boulanger, J. Lecuire, Thin Solid Films 2005, 483, 4-4.
20. Frari D. Del, S. Diliberto, N. Stein, C. Boulanger, J. Lecuire, J. Appl. Electrochem. 2006, 36, 44-9.
21. F. Xiao, B. Yoo, K. Lee, N. Myung, Nanotechnology 2007, 18, 33520-3.
22. K. Tittes, W. Plieth, J. Solid State Electrochem. 2007, 11, 15-5.
23. S. Li, H. Soliman, J Zhou, M. Toprak, M. Muhammed, D. Platzek, P. Ziolkowski, E. Mueller Chem Mater. 2008, 20, 440-3.
24. M. Nedelcu, M. Sima, A. S. Manea, M. F. Lazarescu, R. V. Ghita, F. Craciunoiu, T. Visan, J. Optoelectron. Adv. Mater. 2002, 4, 99-10-6.
25. F. Li, W. Wang, Appl. Surf. Sci. 2009, 255, 4225-423-1.
26. D. Michel, N. Stein, M. Schneider, C. Boulanger, J. Lecuire, J Appl. Electrochem. 2003, 33, 23-2-7.
27. L. Bu, W. Wang, H. Wang, Appl. Surf. Sci. 2007, 253, 3360-336-5.
28. L. Bu, W. Wang, H. Wang, Mater. Res. Bull. 2008, 43, 1808-181-3.
29. S. Michel, S. Diliberto, N. Stein, B. Bolle, C. Boulanger, J. Solid State Electrochem. 2008, 12, 95-10-1.
30. A. Zimmer, N. Stein, H. Terryn, C. Boulanger, J. Phys. Chem. Solids 2007, 68, 1902-190-7.
31. M. Martin-Gonzalez, G. Snyder, A. Prieto, R. Gronsky, T. Sands, A. Stacy, Nano Lett. 2003, 7, 973-97-7.
32. R. Rostek, V. Sklyarenko, P. Woias, J Mater. Res. 2011, 26, 1785-179-0.
33. F. H. Li, W. Wang, Electrochim. Acta 2010, 55, 5000-500-5.
34. M. Martin-Gonzales, A. L. Prieto, R. Gronsky, T. Sands, A. M. Stacy, Adv. Mater. 2003, 15, 100-3.
35. XRD Patterns PDF 49-1713, PKS-2.01, STOE.
36. XRD Patterns PDF 50-954, PKS-2.01, STOE.
37. H. Nguyen, J. Su, Z. Wang, R. Vullers, P. Vereecken, J. Fransaer, J. Mater. Res. 2011, 26, 1953-195-7.
38. Y. Ma, Q. Hao, B. Poudel, Y. Lan, B. Yu, d. Wang, G. Chen, Z. Ren, Nano Lett. 2008, 8, 258-0.
39. J. Cui, X. Liu, W. Yang, D. Chen, H. Fu, P. Ying, J. Appl. Phys. 2009, 105, 06370-3.
40. C. Jin, G. Zhang, T. Qian, X. Li, Z. Yao, J. Phys. Chem. B. 2005, 109, 1430-143-2.
41. J. Lee, Y. Kim, L. Cagnon, U. Goesele, J. Lee, K. Nielsch, Phys. Status Solidi-Rapid Res. Lett. 2010, 4, 43-4-5.
42. K. Reinsberg, C. Schumacher, K. Nielsch, J. Broekaert, J. Anal. Atomic Spectrom. 2011, 26, 2477-248-2.
43. G. Rampelberg, M. Schaekers, K. Martens, Q. Xie, D. Deduytsche, B. De Schutter, N. Blasco, J. Kittl, C. Detavernier, Appl. Phys. Lett. 2011, 98, 16290-2.
44. J. Snyder, S. Toberer, Nat. Mater. 2008, 7, 105-11-4.