Pulsed electrodeposition of (Bi1-xSbx) 2Te3 thermoelectric thin films

Journal of Applied Electrochemistry

Volumn 36, Issue 4, 2006, Pages 449-454

  Del Frari, Doriane ^a   Diliberto, Sebastien ^a   Stein, Nicolas ^a   Boulanger, Clotilde ^a   Lecuire, Jean Marie ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Bismuth antimony telluride; Electrodeposition; Pulsed technique; Thermoelectric properties; Thin films

Indexed keywords

ELECTRODEPOSITION; ELECTROLYTES; GRAIN SIZE AND SHAPE; GROWTH (MATERIALS); STOICHIOMETRY; THERMOELECTRICITY; THIN FILMS;

BISMUTH ANTIMONY TELLURIDE; PULSE PLATING; PULSED TECHNIQUE; THERMOELECTRIC PROPERTIES;

BISMUTH COMPOUNDS;

EID: 32044433516     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10800-005-9097-4     Document Type: Article

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