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Journal of Materials Chemistry C

Volumn 1, Issue 24, 2013, Pages 3862-3870

Hydrogen-free PECVD growth of few-layer graphene on an ultra-thin nickel film at the threshold dissolution temperature

(7) Peng, Kaung Jay a Wu, Chung Lun a Lin, Yung Hsiang a Liu, Yen Ju a Tsai, Din Ping a Pai, Yi Hao b Lin, Gong Ru a

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b NATIONAL DONG HWA UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DISSOLUTION; HYDROGEN; METALLIC FILMS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRECIPITATES; RAMAN SCATTERING;

CARBON DISSOLUTION; CRITICAL THICKNESS; DISSOLUTION TEMPERATURE; FEW-LAYER GRAPHENE; LINEAR TRANSMITTANCE; RAMAN SCATTERING PEAKS; SCATTERING ANALYSIS; THRESHOLD TEMPERATURES;

GRAPHENE;

EID: 84878716766 PISSN: 20507534 EISSN: 20507526 Source Type: Journal
DOI: 10.1039/c3tc30332b Document Type: Article

Times cited : (75)

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