Synthesis of large-area graphene layers on poly-nickel substrate by chemical vapor deposition: Wrinkle formation

Advanced Materials

Volumn 21, Issue 22, 2009, Pages 2328-2333

  Chae, Seung Jin ^b   Güneş, Fethullah ^b   Kim, Ki Kang ^b   Kim, Eun Sung ^b   Han, Gang Hee ^b   Kim, Soo Min ^b   Shin, Hyeonjin ^a,b   Yoon, Seon Mi ^a   Choi, Jae Young ^a   Park, Min Ho ^c   Yang, Cheol Woong ^c   Pribat, Didier ^d   Lee, Young Hee ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Sungkyunkwan University   (South Korea)

^c Sungkyunkwan University   (South Korea)

^d LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON ATOMS; CARBON SOLUBILITY; ELECTRONIC DEVICE; GAS-MIXING; GRAPHENE; GRAPHENE LAYERS; GRAPHENES; GROWTH TIME; HIGH CRYSTALLINITY; NI SUBSTRATES; NICKEL SUBSTRATES; OUT-DIFFUSION; QUENCHING RATE; SOLAR-CELL APPLICATIONS; THERMAL QUENCHING; TOUCH PANELS; WRINKLE FORMATION;

ATOMS; GRAIN BOUNDARIES; NICKEL; QUENCHING; SUBSTRATES; THIN FILM TRANSISTORS; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 67649277234     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200803016     Document Type: Article

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