Block co-polymer guided self-assembly by surface chemical modification: Optimization of multiple patterning process and pattern transfer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Oria, Lorea ^a   Ruiz De Luzuriaga, Alaitz ^b   Alduncín, Juan A ^b   Pérez Murano, Francesc ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b Centro de Investigacion Tecnologica En Electroquimica   (Spain)

Author keywords

block co polymer; chemical surface modification; Guided self assembly; multiple patterning; polymer brush

Indexed keywords

DENDRIMERS; PHOTOLITHOGRAPHY; SELF ASSEMBLY;

CHEMICAL SURFACE MODIFICATION; GUIDED SELF-ASSEMBLY; LITHOGRAPHIC METHODS; MULTIPLE PATTERNING; NANOMETER SCALE STRUCTURE; PATTERN SPECIFICATIONS; POLYMER BRUSHES; SURFACE CHEMICAL MODIFICATIONS;

CHEMICAL MODIFICATION;

EID: 84878402760     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916339     Document Type: Conference Paper

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