Self-assembling study of a cylinder-forming block copolymer via a nucleation-growth mechanism

Nanotechnology

Volumn 20, Issue 9, 2009, Pages

  Aissou, Karim ^a   Kogelschatz, Martin ^a   Baron, Thierry ^a  

^a Joseph Fourier University   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMER THIN FILMS; DISORDERED PHASE; GROWTH MECHANISMS; METHYL METHACRYLATES; NANOMETRIC SCALE; ORDERED PHASE; SELF-ASSEMBLING; SELF-ASSEMBLING STRUCTURES; SUBSTRATE SURFACES; VERTICAL CYLINDERS;

BLOCK COPOLYMERS; COPOLYMERIZATION; ESTERS; LANDFORMS; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; NUCLEATION; POLYMERS; SOIL CONSERVATION; STYRENE; SURFACE TENSION;

CYLINDERS (SHAPES);

COPOLYMER; POLY(STYRENE BLOCK METHYLMETHACRYLATE); UNCLASSIFIED DRUG; METHACRYLIC ACID DERIVATIVE; NANOMATERIAL; POLYSTYRENE BLOCK POLY(METHYL METHACRYLATE); POLYSTYRENE DERIVATIVE; POLYSTYRENE-BLOCK-POLY(METHYL METHACRYLATE);

ARTICLE; CHEMICAL INTERACTION; CHEMICAL REACTION KINETICS; CHEMICAL STRUCTURE; PRIORITY JOURNAL; SEGREGATION ANALYSIS; SURFACE TENSION; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; METHACRYLATES; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; POLYSTYRENES; SURFACE PROPERTIES;

EID: 65549169206     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/9/095602     Document Type: Article

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