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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 31, Issue 3, 2013, Pages

Preparation of a clean Ge(001) surface using oxygen plasma cleaning

(4) Ponath, Patrick a Posadas, Agham B a Hatch, Richard C a Demkov, Alexander A a

a UNIVERSITY OF TEXAS AT AUSTIN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; OXYGEN; PHOTOELECTRONS; PLASMAS; WET ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE-RESOLVED PHOTOEMISSION; ATOMIC FORCE MICROSCOPE IMAGES; CARBON CONTAMINATION; GERMANIUM SURFACE; MEAN SURFACE ROUGHNESS; OXYGEN PLASMAS; PLASMA CLEANING; SITU X-RAY PHOTOELECTRON SPECTROSCOPY;

GERMANIUM;

EID: 84878367299 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.4798390 Document Type: Article

Times cited : (44)

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