Germanium surface cleaning with hydrochloric acid

ECS Transactions

Volumn 3, Issue 7, 2006, Pages 1191-1196

  Kim, J ^a   Liu, S ^b   Tan, S ^b   McVittie, J ^a   Saraswat, K ^a   Nishi, Y ^a  

^a Stanford University   (United States)

^b Chemtrace Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); CONTAMINATION; GERMANIUM; HYDROCHLORIC ACID; PASSIVATION; SUBSTRATES; SURFACE ROUGHNESS;

METAL RECOVERY RATES; PARTICLE REMOVAL; SUB-OXIDE LAYERS;

SURFACE CLEANING;

EID: 33846942296     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2355913     Document Type: Conference Paper

References (6)

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2. A. C. Diebold and B. Doris, Surface and Interface Analysis, 20, 127 (1993).
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6. A. Shimazaki, in Ultraclean Surface Processing of Silicon Wafers, T. Hattori, Editor, p.171, Springer, Berlin (1998).