Organic [6,6]-phenyl-C61-butyric-acid-methyl-ester field effect transistors: Analysis of the contact properties by combined photoemission spectroscopy and electrical measurements

Journal of Applied Physics

Volumn 113, Issue 17, 2013, Pages

  Scheinert, S ^a   Grobosch, M ^b   Sprogies, J ^a   Horselmann I ^a   Knupfer, M ^b   Paasch, G ^b  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL MEASUREMENT; ELECTRON-INJECTION BARRIER; HOLE INJECTION BARRIERS; ORDERS OF MAGNITUDE; ORGANIC/METAL INTERFACES; PREPARATION PROCESS; SMALL GOLD CLUSTERS; VALENCE BAND PHOTOEMISSION;

BUTYRIC ACID; CONTACTS (FLUID MECHANICS); GOLD; GOLD COMPOUNDS; ORGANIC FIELD EFFECT TRANSISTORS; PHOTOELECTRON SPECTROSCOPY;

ELECTRIC PROPERTIES;

EID: 84877775283     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4803134     Document Type: Conference Paper

References (55)

1. M. Fahlman, A. Crispin, X. Crispin, S.-K. M. Henze, M.-P. de Jong, W. Osikowicz, C. Tengstedt, and W. R. Salaneck, J. Phys.: Condens. Matter 19, 183202 (2007). 10.1088/0953-8984/19/18/183202
2. J. Hwang, E. G. Kim, J. Liu, J. L. Brédas, A. Duggal, and A. Kahn, J. Phys. Chem. C 111, 1378 (2007). 10.1021/jp067004w
3. W. R. Salaneck and M. Fahlman, J. Mater. Res. 19, 1917 (2004). 10.1557/JMR.2004.0262
4. G. Greczynski, Th. Kugler, and W. R. Salaneck, J. Appl. Phys. 88, 7187 (2000). 10.1063/1.1328059
5. C. Tengstedt, W. Osikowicz, W. R. Salaneck, I. D. Parker, C. H. Hsu, and M. Fahlman, Appl. Phys. Lett. 88, 053502 (2006). 10.1063/1.2168515
6. S. Scheinert, M. Grobosch, G. Paasch, I. Hörselmann, M. Knupfer, and J. Bartsch, J. Appl. Phys. 111, 064502 (2012). 10.1063/1.3693541
7. J. Nakamura and K. Murata, Appl. Phys. Lett. 87, 132105 (2005). 10.1063/1.2058210
8. A. Moulé and K. Meerholz, Adv. Mater. 20, 240 (2008). 10.1002/adma.200701519
9. S. Cho, J. Yuen, J. Kim, K. Lee, and A. Heeger, Appl. Phys. Lett. 90, 063511 (2007). 10.1063/1.2457801
10. P. Wöbkenberg, D. Bradley, D. Kronholm, J. Hummelen, D. de Leeuw, M. Cölle, and T. Anthopoulos, Synth. Met. 158, 468 (2008). 10.1016/j.synthmet.2008.03.016
11. J. Ball, R. Bouwer, F. Kooistra, J. Frost, Y. Qi, E. Domingo, J. Smith, D. de Leeuw, J. Hummelen, J. Nelson, J. Appl. Phys. 110, 014506 (2011). 10.1063/1.3605531
12. S. Nam, J. Jang, H. Cha, J. Hwang, T. An, S. Park, and C. Park, J. Mater. Chem. 22, 5543 (2012). 10.1039/c2jm15260f
13. E. von Hauff and J. Parisi, J. Appl. Phys. 100, 043702 (2006). 10.1063/1.2234806
14. H. Ishii, K. Sugiyama, E. Ito, and K. Seki, Adv. Mater. 11, 605 (1999). 10.1002/(SICI)1521-4095(199906)11:8<605::AID-ADMA605>3.0.CO;2-Q
15. W. R. Salaneck, K. Seki, A. Kahn, and J. J. Pireaux, Conjugated Polymer and Molecular Interfaces: Science and Technology for Photonic and Optoelectronic Applications (Marcel Dekker, New York, 2002), and references therein.
16. A. Kahn, N. Koch, and W. Gao, J. Polym. Sci. B 41, 2529 (2003) 10.1002/polb.10642.
17. M. Knupfer and G. Paasch, J. Vac. Sci. Technol. A 23, 1072 (2005). 10.1116/1.1885021
18. N. Koch, J. Phys.: Condensed Matter 20, 184008 (2008). 10.1088/0953-8984/20/18/184008
19. S. Braun, W. R. Salaneck, and M. Fahlman, Adv. Mater. 21, 1450 (2009). 10.1002/adma.200802893
20. Y. Gao, Mater. Sci. Eng. R 68, 39 (2010). 10.1016/j.mser.2010.01.001
21. M. Grobosch and M. Knupfer, Open Appl. Phys. J. 4, 8 (2011). 10.2174/1874183501104010008
22. C. Shen, I. G. Hill, and A. Kahn, Adv. Mater. 11, 1523 (1999). 10.1002/(SICI)1521-4095(199912)11:18<1523::AID-ADMA1523>3.0.CO;2-K
23. A. Wan, J. Hwang, F. Amy, and A. Kahn, Org. Electron. 6, 47 (2005). 10.1016/j.orgel.2005.02.003
24. M. Grobosch and M. Knupfer, Adv. Mater. 19, 754 (2007). 10.1002/adma.200602435
25. M. Grobosch, C. Schmidt, W. J. M. Naber, W. G. van der Wiel, and M. Knupfer, Synth. Met. 160, 238 (2010). 10.1016/j.synthmet.2009.09.014
26. T. R. Ohno, Y. Chen, S. E. Harvey, G. H. Kroll, P. J. Benning, J. H. Weaver, L. P. F. Chibante, and R. E. Smalley Phys. Rev. B 47, 2389 (1993). 10.1103/PhysRevB.47.2389
27. S. Scheinert and G. Paasch, Phys. Status Solidi A 201, 1263 (2004). 10.1002/pssa.200404335
28. A. Rajagopal and A. Kahn, J. Appl. Phys. 84, 355 (1998). 10.1063/1.368035
29. M. Gorgoi and D. R. Zahn, Appl. Surf. Sci. 252, 5453 (2006). 10.1016/j.apsusc.2005.12.067
30. V. Y. Aristov, O. V. Molodtsova, C. Laubschat, V. M. Zhilin, I. M. Aristova, V. V. Kveder, and Knu, Appl. Phy. Lett. 97, 113103 (2010). 10.1063/1.3488809
31. J. Ivanco, T. Toader, A. Firsov, M. Brzhezinskaya, M. Sperling, W. Braun, and D. R. T. Zahn, Phys. Rev. B 81, 115325 (2010). 10.1103/PhysRevB.81.115325
32. S. Scheinert and G. Paasch, J. Appl. Phys. 105, 014509 (2009). 10.1063/1.3058640
33. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer Cooperation, 1992).
34. H. Ding, S. Zorba, Y. Gao, L. Ma, and Y. Yang, J. Appl. Phys. 100, 113706 (2006). 10.1063/1.2397292
35. G. Faraci, S. La Rosa, A. R. Pennisi, Y. Hwu, and G. Margaritondo, Phys. Rev. B 47, 4052 (1993). 10.1103/PhysRevB.47.4052
36. G. Faraci, S. La Rosa, A. R. Pennisi, Y. Hwu, and G. Margaritondo, J. Appl. Phys. 78, 4091 (1995). 10.1063/1.359866
37. K. L. Wang, B. Lai, M. Lu, X. Zhou, L. S. Liao, X. M. Ding, X. Y. Hou, and S. T. Lee, Thin Solid Films 363, 178 (2000). 10.1016/S0040-6090(99)00991-8
38. H. B. Michaelson, J. Appl. Phys. 48, 4729 (1977). 10.1063/1.323539
39. M. Grobosch, K. Dörr, R. G. Gangineni, and M. Knupfer, Appl. Phys. A 95, 95 (2009). 10.1007/s00339-008-5001-5
40. Z.-L. Guan, J. B. Kim, H. Wang, C. Jaye, D. A. Fischer, Y.-L. Loo, and Kah, Org. Electron. 11, 1779 (2010). 10.1016/j.orgel.2010.07.023
41. M. H. Richter, D. Friedrich, and D. Schmeier Bio NanoScience 2, 59 (2012). 10.1007/s12668-011-0034-1
42. M. P. Felissimo, D. Jarzab, M. Gorgoi, M. Forster, U. Scherf, M. C. Scharber, S. Svensson, P. Rudolf, and M. A. Loi, J. Mater. Chem. 19, 4899 (2009). 10.1039/b906297a
43. G. Lopez, D. G. Castner, and B. D. Ratner, Surf. Interface Anal. 17, 267 (1991). 10.1002/sia.740170508
44. N. Schmerl and G. Andersson, Phys. Chem. Chem. Phys. 13, 14993 (2011). 10.1039/c1cp20734b
45. W.-H. Tseng, M.-H. Chen, J.-Y. Wang, C.-T. Tseng, H. Lo, P.-S. Wang, and C.-I. Wu, Sol. Energy Mater. Sol. Cells 95, 3424 (2011) 10.1016/j.solmat.2011. 07.036.
46. K. Akaike, K. Kanai, Y. Ouchi, and K. Seki, Appl. Phys. Lett. 94, 043309 (2009). 10.1063/1.3076121
47. K. Akaike, K. Kanai, Y. Ouchi, and K. Seki, Appl. Phys. Lett. 95, 113306 (2009). 10.1063/1.3231926
48. K. Akaike, K. Kanai, H. Yoshida, J. Tsutsumi, T. Nishi, N. Sato, Y. Ouchi, and K. Seki, J. Appl. Phys. 104, 023710 (2008). 10.1063/1.2957588
49. H. Kröger, P. Reinke, M. Büttner, and P. Oelhafen, J. Chem. Phys. 123, 114706 (2005). 10.1063/1.2018838
50. L. Lozzi, S. Santucci, and S. La Rosa, J. Vac. Sci. Technol. A 22, 1477 (2004). 10.1116/1.1701860
51. H. Ahn and E. Whiten, J. Appl. Phys. 93, 3384 (2003). 10.1063/1.1554759
52. S. B. DiCenzo, S. D. Berry, and E. H. Hartford, Phys. Rev. B 38, 8465 (1988). 10.1103/PhysRevB.38.8465
53. M. Büttner and P. Oelhafen, Surf. Sci. 600, 1170 (2006). 10.1016/j.susc.2006.01.020
54. Sentaurus Device User Guide, Version F-2011.09 (Synopsys, 2011).
55. R. Agrawal and S. Ghosh, Appl. Phys. Lett. 89, 222114 (2006). 10.1063/1.2398930