Photoemission study of tris(8-hydroxyquinoline) aluminum/aluminum oxide/tris(8-hydroxyquinoline) aluminum interface

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Ding, Huanjun ^a   Zorba, Serkan ^a   Gao, Yongli ^a   Ma, Liping ^b   Yang, Yang ^b  

^a UNIVERSITY OF ROCHESTER   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM DEPOSITION; ALUMINUM OXIDE; INTERFACE ELECTRONIC STRUCTURE; PHOTOEMISSION SPECTROSCOPY;

ALUMINUM COMPOUNDS; CHEMICAL REACTIONS; ELECTRON ENERGY LEVELS; ELECTRONIC STRUCTURE; PHOTOEMISSION;

PHASE INTERFACES;

EID: 33845725270     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2397292     Document Type: Article

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