Superhydrophobic transparent surface of nanostructured poly(methyl methacrylate) enhanced by a hydrolysis reaction

Plasma Processes and Polymers

Volumn 10, Issue 5, 2013, Pages 481-488

  Her, E K ^a,b   Ko, T J ^a,b   Shin, B ^a,b   Roh, H ^b   Dai, W ^a   Seong, W K ^a   Kim, H Y ^b   Lee, K R ^a   Oh, K H ^b   Moon, M W ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

hydrolysis; hydrophobic coatings; plasma etching; poly(methly methacrylate) (PMMA); transparency

Indexed keywords

HYDROLYSIS REACTION; HYDROPHOBIC COATINGS; POLY(METHLY METHACRYLATE) (PMMA); POLY(METHYL METHACRYLATE) (PMMA); SUBSEQUENT HYDROLYSIS; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBIC; TRANSPARENT SURFACES;

ASPECT RATIO; COATINGS; ESTERS; HYDROPHOBICITY; PLASMA APPLICATIONS; PLASMA ETCHING; TRANSPARENCY;

HYDROLYSIS;

EID: 84877285309     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201200131     Document Type: Article

References (30)

1. S. Guruvenket, G. R. S. Iyer, L. Shestakova, P. Morgen, N. B. Larsen, G. Mohan Rao, Appl. Surf. Sci. 2008, 254, 5722.
2. U. Schulz, P. Munzert, N. Kaiser, J. Adhes. Sci. Technol. 2010, 24, 1283.
3. N. Vourdas, A. Tserepi, E. Gogolides, Nanotechnology 2007, 18, 125304.
4. M. C. Almazan-Almazan, J. I. Paredes, M. Perez-Mendoza, M. Domingo-Garcia, F. J. Lopez-Garzon, A. Martinez-Alonso, J. M. Tascon, J. Colloid Interface Sci. 2005, 287, 57.
5. K. Tsougeni, A. Tserepi, V. Constantoudis, E. Gogolides, P. S. Petrou, S. E. Kakabakos, Langmuir 2010, 26, 13883.
6. J. L. Mauer, J. S. Logan, L. B. Zielinski, G. C. Schwartz, J. Vac. Sci. Technol. 1978, 15, 1734.
7. M. D. Henry, S. Walavalkar, A. Homyk, A. Scherer, Nanotechnology 2009, 20, 255305.
8. B. S. Kim, S. Shin, S. J. Shin, K. M. Kim, H. H. Cho, Nanoscale Res. Lett. 2011, 6, 333.
9. R. Di Mundo, M. Ambrico, P. F. Ambrico, R. d'Agostino, F. Italiano, F. Palumbo, Plasma Process. Polym. 2011, 8, 239.
10. R. Di Mundo, F. Palumbo, R. d'Agostino, Langmuir 2010, 26, 5196.
11. A. Kaless, U. Schulz, P. Munzert, N. Kaiser, Surf. Coat. Technol. 2005, 200, 58.
12. R. Di Mundo, M. Troia, F. Palumbo, M. Trotta, R. d'Agostino, Plasma Process. Polym. 2012, 9, 947.
13. T. G. Cha, J. W. Yi, M. W. Moon, K. R. Lee, H. Y. Kim, Langmuir 2010, 26, 8319.
14. T.-Y. Kim, B. Ingmar, K. Bewilogua, K. H. Oh, K.-R. Lee, Chem. Phys. Lett. 2007, 436, 199.
15. Y. Rahmawan, M. W. Moon, K. S. Kim, K. R. Lee, K. Y. Suh, Langmuir 2010, 26, 484.
16. I. D. Tevis, S. I. Stupp, Nanoscale 2011, 3, 2162.
17. W. Dai, T.-J. Ko, K. H. Oh, K.-R. Lee, M.-W. Moon, Plasma Process. Polym. 2012, 9, 975.
18. E. K. Her, H. S. Chung, M. W. Moon, K. H. Oh, Nanotechnology 2009, 20, 285301.
19. Y.-H. Ting, C.-C. Liu, S.-M. Park, H. Jiang, P. F. Nealey, A. E. Wendt, Polymers 2010, 2, 649.
20. P. Gröning, O. Küttel, M. Collaud-Coen, G. Dietler, L. Schlapbach, Appl. Surf. Sci. 1995, 89, 83.
21. E. Kim, S. Hong, J. D. Gorman, S. Lim, S.-Y. Moon, D.-W. Kim, K. No, Thin Solid Films 1998, 324, 292.
22. D. Bartolo, F. Bouamrirene, É. Verneuil, A. Buguin, P. Silberzan, S. Moulinet, EPL (Europhys. Lett.) 2006, 74, 299.
23. B. J. Briscoe, D. R. Williams, K. P. Galvin, Colloids Surf. A 2005, 264, 101.
24. T.-J. Ko, E. K. Her, B. Shin, H.-Y. Kim, K.-R. Lee, B. K. Hong, S. H. Kim, K. H. Oh, M.-W. Moon, Carbon 2012, 50, 5085.
25. B. Shin, K.-R. Lee, M.-W. Moon, H.-Y. Kim, Soft Matter 2012, 8, 1817.
26. A. Lafuma, D. Quéré, Nat. Mater. 2003, 2, 457.
27. R. Di Mundo, V. De Benedictis, F. Palumbo, R. d'Agostino, Appl. Surf. Sci. 2009, 255, 5461.
28. Y. Wang, N. Lu, H. Xu, G. Shi, M. Xu, X. Lin, H. Li, W. Wang, D. Qi, Y. Lu, L. Chi, Nano Res. 2010, 3, 520.
29. S. Chattopadhyay, Y. F. Huang, Y. J. Jen, A. Ganguly, K. H. Chen, L. C. Chen, Mater. Sci. Eng. R: Rep. 2010, 69, 1.
30. R. G. Karunakaran, C. H. Lu, Z. Zhang, S. Yang, Langmuir 2011, 27, 4594.