Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area

Nanoscale Research Letters

Volumn 6, Issue 1, 2011, Pages

  Kim, Beom Seok ^a   Shin, Sangwoo ^a   Shin, Seung Jae ^a   Kim, Kyung Min ^a   Cho, Hyung Hee ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; DRY ETCHING; HEAT TRANSFER PERFORMANCE; HYDROPHOBICITY; NANOWIRES; PASSIVATION; SILICON WAFERS; SURFACE ROUGHNESS; WETTING; PHASE TRANSITIONS; WET ETCHING;

BOILING HEAT TRANSFER; FABRICATION PROCESS; HIERARCHICAL STRUCTURES; LENGTH TO DIAMETER RATIO; NANO-SCALE SURFACES; PERFORMANCE ENHANCEMENTS; SILICON WET ETCHING; SUPERHYDROPHILIC BEHAVIOR; BOSCH PROCESS; ELECTROLESS; HYBRID STRUCTURE; MICRO PATTERN; MICRO-NANO; MICRO-PILLARS; NANOWIRE SYNTHESIS; PASSIVATION LAYER; SILICON ETCHING; SURFACE AREA; SURFACE WETTABILITY; WAFER-SCALE;

WET ETCHING; DRY ETCHING;

EID: 84255182654     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-333     Document Type: Article

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