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Journal of Applied Physics

Volumn 111, Issue 2, 2012, Pages

Environment and baking influence on charge retention on silicon nitride charge trap layers

(5) Sridhara, Karthik a Borowik, Łukasz a Mariolle, Denis a Chevalier, Nicolas a Colonna, Jean Philippe a

a CEA GRENOBLE (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CHARACTERISTICS; CHARGE RETENTION; CHARGE STORAGE CAPACITY; KELVIN FORCE MICROSCOPY; POISSON SOLVERS; STORAGE CAPACITY; STRONG LOCALIZATIONS; SURFACE CONTAMINATIONS;

SILICON;

SILICON NITRIDE;

EID: 84876788284 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3678455 Document Type: Article

Times cited : (4)

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