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Volumn 35, Issue 7, 2013, Pages 1352-1359

Structural, optical and light scattering properties of post etched RF sputtered ZnO:Al thin films deposited at various substrate temperature

Author keywords

Dislocation density; Light scattering properties; RF magnetron sputtering; Urbach energy; Wet chemical etching; ZnO thin films

Indexed keywords

ALUMINA; ALUMINUM OXIDE; CHLORINE COMPOUNDS; ENERGY GAP; II-VI SEMICONDUCTORS; LIGHT SCATTERING; MAGNETRON SPUTTERING; METALLIC FILMS; REFRACTIVE INDEX; SOLAR CELLS; SURFACE SCATTERING; THIN FILMS; WET ETCHING; ZINC OXIDE;

EID: 84876670528     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2013.01.037     Document Type: Article
Times cited : (36)

References (51)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.