Influence of atomic hydrogen on transparent conducting oxides during hydrogenated amorphous and microcrystalline Si preparation by catalytic chemical vapor deposition

Thin Solid Films

Volumn 411, Issue 1, 2002, Pages 166-170

  Masuda, Atsushi ^a   Imamori, Kensaku ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic chemical vapor deposition; Hydrogenated amorphous silicon; Hydrogenated microcrystalline silicon; Transparent conducting oxides

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COATINGS; CONDUCTIVE MATERIALS; HYDROGENATION; PASSIVATION; TIN COMPOUNDS; ZINC OXIDE;

MICROCRYSTALLINE MATERIALS;

OXIDES;

EID: 0037157436     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00207-9     Document Type: Conference Paper

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