SCOPUS 정보 검색 플랫폼

Volumn 22, Issue 16, 2012, Pages 8005-8012

Mechanism of an AZO-coated FTO film in improving the hydrogen plasma durability of transparent conducting oxide thin films for amorphous-silicon based tandem solar cells

(5) Chantarat, N a Hsu, Shu Han b Lin, Chin Ching c Chiang, Mei Ching c Chen, San Yuan a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; AL-DOPED ZNO; AZO FILMS; DOUBLE-LAYER FILMS; FILM STRUCTURE; HALL MEASUREMENTS; HYDROGEN PLASMAS; ION DIFFUSION; METAL OXIDES; PLASMA TREATMENT; POST ANNEALING TREATMENT; PROTECTION LAYERS; RADIO-FREQUENCY-MAGNETRON SPUTTERING; REDOX PROCESS; SI SOLAR CELLS; TANDEM SOLAR CELLS; TRANSPARENT CONDUCTING OXIDE THIN FILMS;

AMORPHOUS FILMS; AMORPHOUS SILICON; ELECTRIC PROPERTIES; HYDROGEN; INTERFACES (MATERIALS); IONS; METALLIC COMPOUNDS; PLASMA APPLICATIONS; PLASMA STABILITY; SILICON; SILICON SOLAR CELLS; SPRAY PYROLYSIS; ZINC OXIDE;

TIN;

EID: 84859255823 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm15682b Document Type: Article

Times cited : (30)

References (20)

1
- 0031272368
- H. Stibig F. Siebke W. Beyer C. Beneking B. Rech H. Wagner Sol. Energy Mater. Sol. Cells 1997 48 351 363
- (1997) Sol. Energy Mater. Sol. Cells , vol.48 , pp. 351-363
- Stibig, H.¹ Siebke, F.² Beyer, W.³ Beneking, C.⁴ Rech, B.⁵ Wagner, H.⁶

2
- 0026138096
- T. Hayashi K. Kawabata K. Yamada S. Miyazaki M. Hirose Jpn. J. Appl. Phys. 1991 30 675 678
- (1991) Jpn. J. Appl. Phys. , vol.30 , pp. 675-678
- Hayashi, T.¹ Kawabata, K.² Yamada, K.³ Miyazaki, S.⁴ Hirose, M.⁵

3
- 0000597999
- J. Wallinga W. M. Arnoldbik A. M. Vredenberg R. E. I. Schropp W. F. Van der Weg J. Phys. Chem. B 1998 102 6219 6224
- (1998) J. Phys. Chem. B , vol.102 , pp. 6219-6224
- Wallinga, J.¹ Arnoldbik, W.M.² Vredenberg, A.M.³ Schropp, R.E.I.⁴ Van Der Weg, W.F.⁵

4
- 0001157546
- S. Major M. C. Bhatnagar S. Kumar K. L. Chopra J. Vac. Sci. Technol., A 1988 6 2415 2420
- (1988) J. Vac. Sci. Technol., A , vol.6 , pp. 2415-2420
- Major, S.¹ Bhatnagar, M.C.² Kumar, S.³ Chopra, K.L.⁴

5
- 35649023188
- K. Xiong J. Robertson S. J. Clark J. Appl. Phys. 2007 102 083710
- (2007) J. Appl. Phys. , vol.102 , pp. 083710
- Xiong, K.¹ Robertson, J.² Clark, S.J.³

6
- 77950531302
- K. Ahn Y. S. Jeong H. U. Lee S. Y. Jeong H. S. Ahn H. S. Kim S. G. Yoon C. R. Cho Thin Solid Films 2010 518 4066 4070
- (2010) Thin Solid Films , vol.518 , pp. 4066-4070
- Ahn, K.¹ Jeong, Y.S.² Lee, H.U.³ Jeong, S.Y.⁴ Ahn, H.S.⁵ Kim, H.S.⁶ Yoon, S.G.⁷ Cho, C.R.⁸

7
- 42549124490
- S. H. Lee T. S. Lee K. S. Lee B. Cheong Y. D. Kim W. M. Kim J. Phys. D: Appl. Phys. 2008 41 095303
- (2008) J. Phys. D: Appl. Phys. , vol.41 , pp. 095303
- Lee, S.H.¹ Lee, T.S.² Lee, K.S.³ Cheong, B.⁴ Kim, Y.D.⁵ Kim, W.M.⁶

8
- 0031192970
- C. H. Lee K. S. Lim J. Song Jpn. J. Appl. Phys. 1997 36 4418 4422
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 4418-4422
- Lee, C.H.¹ Lim, K.S.² Song, J.³

9
- 18244430368
- C. Van de Walle Phys. Rev. Lett. 2000 85 1012 1015
- (2000) Phys. Rev. Lett. , vol.85 , pp. 1012-1015
- Van De Walle, C.¹

10
- 41649103043
- J. Bang K. J. Chang Appl. Phys. Lett. 2008 92 132109
- (2008) Appl. Phys. Lett. , vol.92 , pp. 132109
- Bang, J.¹ Chang, K.J.²

11
- 0000162419
- H. Kim C. M. Gilmore A. Piqué J. S. Horwitz H. Mattoussi H. Murata Z. H. Kafafi D. B. Chrisey J. Appl. Phys. 1999 86 6451 6461
- (1999) J. Appl. Phys. , vol.86 , pp. 6451-6461
- Kim, H.¹ Gilmore, C.M.² Piqué, A.³ Horwitz, J.S.⁴ Mattoussi, H.⁵ Murata, H.⁶ Kafafi, Z.H.⁷ Chrisey, D.B.⁸

12
- 33846875663
- A. I. Martínez L. Huerta J. M. O. Rueda de León D. Acosta O. Malik M. Aguilar J. Phys. D: Appl. Phys. 2006 39 5091 5096
- (2006) J. Phys. D: Appl. Phys. , vol.39 , pp. 5091-5096
- Martínez, A.I.¹ Huerta, L.² Rueda De León, J.M.O.³ Acosta, D.⁴ Malik, O.⁵ Aguilar, M.⁶

13
- 78751626618
- J. Suffner P. Ágoston J. Kling H. Hahn J. Nanopart. Res. 2010 12 2579 2588
- (2010) J. Nanopart. Res. , vol.12 , pp. 2579-2588
- Suffner, J.¹ Ágoston, P.² Kling, J.³ Hahn, H.⁴

14
- 61649104800
- J. H. Noh S. Lee J. Y. Kim J. K. Lee H. S. Han C. M. Cho I. S. Cho H. S. Jung K. S. Hong J. Phys. Chem. C 2009 113 1083 1087
- (2009) J. Phys. Chem. C , vol.113 , pp. 1083-1087
- Noh, J.H.¹ Lee, S.² Kim, J.Y.³ Lee, J.K.⁴ Han, H.S.⁵ Cho, C.M.⁶ Cho, I.S.⁷ Jung, H.S.⁸ Hong, K.S.⁹

15
- 2442636706
- T. Kawashima T. Ezure K. Okada H. Matsui K. Goto Tanabe J. Photochem. Photobiol., A 2004 164 199 202
- (2004) J. Photochem. Photobiol., A , vol.164 , pp. 199-202
- Kawashima, T.¹ Ezure, T.² Okada, K.³ Matsui, H.⁴ Goto, K.⁵ Tanabe⁶

16
- 78650251700
- N. Chantarat Y. W. Chen C. C. Lin M. C. Chiang S. Y. Chen Inorg. Chem. 2010 49 11077 11083
- (2010) Inorg. Chem. , vol.49 , pp. 11077-11083
- Chantarat, N.¹ Chen, Y.W.² Lin, C.C.³ Chiang, M.C.⁴ Chen, S.Y.⁵

17
- 73849084514
- C. C. Lin Y. W. Chen M. C. Chiang C. H. Lee Y. L. Tung S. Y. Chen J. Electrochem. Soc. 2010 157 H227 H230
- (2010) J. Electrochem. Soc. , vol.157
- Lin, C.C.¹ Chen, Y.W.² Chiang, M.C.³ Lee, C.H.⁴ Tung, Y.L.⁵ Chen, S.Y.⁶

18
- 0033891802
- T. Kawabe S. Shimomura T. Karasuda K. Tabata K. Suzuki Y. Yamaguchi Surf. Sci. 2000 448 101 107
- (2000) Surf. Sci. , vol.448 , pp. 101-107
- Kawabe, T.¹ Shimomura, S.² Karasuda, T.³ Tabata, K.⁴ Suzuki, K.⁵ Yamaguchi, Y.⁶

19
- 0011011517
- J. C. Liu A. D. Marwick F. K. LeGoues Phys. Rev. B: Condens. Matter 1991 44 1861 1874
- (1991) Phys. Rev. B: Condens. Matter , vol.44 , pp. 1861-1874
- Liu, J.C.¹ Marwick, A.D.² Legoues, F.K.³

20
- 0035898733
- D. Szczuko D. Werner S. Oswald G. Behr K. Wetzig Appl. Surf. Sci. 2001 179 301 306
- (2001) Appl. Surf. Sci. , vol.179 , pp. 301-306
- Szczuko, D.¹ Werner, D.² Oswald, S.³ Behr, G.⁴ Wetzig, K.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.