Surface work function of indium tin oxide treated using plasma immersion ion implantation

Journal of Physics D: Applied Physics

Volumn 46, Issue 17, 2013, Pages

  He, Long ^a   Wu, Zhonghang ^a   Li, Zebin ^a   Ju, Jiaqi ^a   Ou, Qiongrong ^a,b   Liang, Rongqing ^a,b  

^a FUDAN UNIVERSITY   (China)

^b BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH WORK FUNCTION; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; MODIFICATION EFFECT; OXYGEN PLASMA IMMERSION; PLASMA IMMERSION ION IMPLANTATION; SURFACE STOICHIOMETRY; SURFACE WORK FUNCTIONS;

INDUCTIVELY COUPLED PLASMA; ION IMPLANTATION; OXYGEN; PHOTOELECTRONS; PLASMA APPLICATIONS; STOICHIOMETRY; TIN; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

WORK FUNCTION;

EID: 84876474443     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/17/175306     Document Type: Article

References (21)

1. Tang C W and Van slyke S A 1987 Appl. Phys. Lett. 51 913
2. Parker I D 1994 J. Appl. Phys. 75 1656
3. Mason M G, Hung L S, Tang C W, Lee S T, Wong K W and Wang M 1999 J. Appl. Phys. 86 1688
4. Milliron D J, Hill I G, Shen C, Kahn A and Schwartz J 2000 J. Appl. Phys. 87 572
5. Wu C C, Wu C I, Strum J C and Kahn A 1997 Appl. Phys. Lett. 70 1348
6. Li L, Yu S, Lou S L, Li W Z, Jiang Y D and Li W 2008 J. Mater. Sci Mater. Electron. 19 1214
7. Sugiyama K, Ishii H, Ouchi Y and Seki K 2000 J. Appl. Phys. 87 295
8. Lin Y J, Chen Y M and Wang Y C 2005 J. Appl. Phys. 97 083702 (Pubitemid 40914217)
9. Cao X A and Zhang Y Q 2012 Appl. Phys. Lett. 100 183304
10. Brown T M, Lazzerini G M, Parrott L J, Bodrozic V, Bürgi L and Cacialli F 2011 Org. electron. 12 623
11. You Z Z, Dong J Y and Fang S D 2004 Phys. Status Solidi a 201 3221 (Pubitemid 40015680)
12. Anders A 2000 Handbook of Plasma Immersion Ion Implantation and Deposition (New York: Wiley)
13. Beamson G and Briggs D 1992 High Resolution XPS of Organic Polymers: The Scienta ESCA300 Database (New York: Wiley)
14. Lee K H, Jang H W, Kim K B, Tak Y H and Lee J L 2004 J. Appl. Phys. 95 586
15. Fan J C C and Goodenough J B 1977 J. Appl. Phys. 48 3524
16. Yu Y H, Feng X D, Grozea D, Lu Z H, Sodhi R N S, Hor A-M and Aziz H 2001 Appl. Phys. Lett. 78 2595
17. Christou V, Etchells M, Renault O, Dobson P J, Salata O V, Beamson G and Egdell R G 2000 J. Appl. Phys. 88 5180
18. Han D M, Lee J H, Jeong K H and Lee J G 2010 Met. Mater. Int. 16 627
19. Song W, So S K and Cao L 2001 Appl. Phys. A 72 361
20. Chkoda L, Heske C, Sokolowski M, Umbach E, Steuber F, Staudigel J, Stobel M and Simmerer J 2000 Synth. Met. 111-112 315
21. Greiner M T, Helander M G, Tang W-M, Wang Z-B, Qiu J and Lu Z-H 2011 Nature Mater. 11 76-81