Surface modification and characterization of indium-tin oxide for organic light-emitting devices

Journal of Materials Science: Materials in Electronics

Volumn 19, Issue 12, 2008, Pages 1214-1221

  Li, L ^a   Yu, J S ^a   Lou, S L ^a   Li, W Z ^a   Jiang, Y D ^a   Li, W ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACID TREATMENTS; ATOMIC FORCE; ELECTRICAL CONTACTS; ETHANOL TREATMENT; FOUR-POINT PROBE; INDIUM TIN OXIDES; INDIUM-TIN OXIDE; INJECTION CURRENTS; INTERFACE FORMATION; ITO SUBSTRATES; MOLECULAR MATERIALS; ORGANIC LIGHT-EMITTING DEVICES; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; SODIUM HYDROXIDE SOLUTIONS; SURFACE ENERGIES; SURFACE ENERGY MEASUREMENTS; SURFACE MODIFICATIONS; SURFACE STOICHIOMETRY; TREATMENT METHODS; TURN-ON VOLTAGES;

ATOMIC SPECTROSCOPY; CONTACT ANGLE; ELECTRIC RESISTANCE; ELECTROMAGNETIC WAVES; EMISSION SPECTROSCOPY; ETHANOL; INDIUM; INTERFACIAL ENERGY; LIGHT; LIGHT EMISSION; MOLECULAR ORBITALS; MOLECULAR OXYGEN; MOLECULAR SPECTROSCOPY; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; PLASMAS; SODIUM; STOICHIOMETRY; SUBSTRATES; SULFUR; SURFACE CHEMISTRY; SURFACE TENSION; SURFACE TREATMENT; SURFACES; TIN; TITANIUM COMPOUNDS; TRACE ANALYSIS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE PROPERTIES;

EID: 53749083594     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-007-9545-5     Document Type: Article

References (44)

1. J. Yu, Z. Chen, M. Sone, S. Miyata, M. Li, T. Watanabe, Jpn. J. Appl. Phys. 40, 3201 (2001)
2. J. Yu, W. Li, Y. Jiang, L. Li, Jpn. J. Appl. Phys. 46, L31 (2007)
3. F.-C. Chen, Y. Yang, Appl. Phys. Lett. 81, 4278 (2002)
4. Q. Sun, X. Zhan, B. Zhang, C. Yang, Y. Liu, Y. Li, D. Zhu, Polym. Adv. Technol. 15, 70 (2004)
5. C.W. Tang, S.A. Vanslyke, Appl. Phys. Lett. 51, 913 (1987)
6. J.H. Burroughes, D.D.C. Bradley, A.R. Brown, R.N. Marks, K. Mackay, R.H. Friend, P.L. Burns, A.B. Holmes, Nature 347, 539 (1990)
7. J.R. Sheats, H. Antoniadis, M. Hueschen, W. Leonard, J. Miller, R. Moon, D. Roitman, A. Stocking, Science 273, 884 (1996)
8. J.M. Leger, S.A. Carter, B. Ruhstaller, H.-G. Nothofer, U. Scherf, H. Tillman, H.-H. Hörhold, Phys. Rev. B 68, 054209 (2003)
9. S.-F. Hsu, C.-C. Lee, S.-W. Hwang, C.H. Chen, Appl. Phys. Lett. 86, 1 (2005)
10. A.J. Breeze, Z. Schlesinger, S.A. Carter, P.J. Brock, Phys. Rev. B 64, 125205 (2001)
11. E. Kymakis, G.A.J. Amaratunga, Appl. Phys. Lett. 80, 112 (2002)
12. J. Herrero, C. Guillén, Vacuum 67, 611 (2002)
13. Z.Y. Zhong, Y.D. Jiang, J. Colloid Interface Sci. 302, 613 (2006)
14. H. Morikawa, M. Fujita, Thin Solid Films 359, 61 (2000)
15. B.L. Low, F.R. Zhu, K.R. Zhang, S.J. Chua, Thin Solid Films 417, 116 (2002)
16. Y.-H. Tak, K.-B. Kim, H.-G. Park, K.-H. Lee, J.-R. Lee, Thin Solid Films 411, 12 (2001)
17. H.Y. Yu, X.D. Feng, D. Grozea, Z.H. Lu, R.N.S. Sodhi, A.-M. Hor, H. Aziz, Appl. Phys. Lett. 78, 2595 (2001)
18. F. Steuber, J. Staudigel, M. Stössel, J. Simmerer, A. Winnacker, Appl. Phys. Lett. 74, 3558 (1999)
19. H.-T. Lu, M. Yokoyama, J. Cryst. Growth 260, 186 (2004)
20. W. Song, S.K. So, L. Cao, Appl. Phys. A 72, 361 (2001)
21. Z.Z. You, J.Y. Dong, Appl. Surf. Sci. 249, 271 (2005)
22. I.-M. Chan, W.C. Cheng, F.C. Hong, Appl. Phys. Lett. 80, 13 (2002)
23. B. Choi, H. Yoon, H.H. Lee, Appl. Phys. Lett. 76, 412 (2000)
24. I.-M. Chan, F.C.-N. Hong, Thin Solid Films 444, 254 (2003)
25. T.P. Nguyen, P. Le Rendu, N.N. Dinh, M. Fourmigué, C. Mézière, Synth. Met. 138, 229 (2003)
26. C. Suess, F.P. Wenzl, G. Jakopic, M. Wuchse, S. Muellegger, N. Koch, A. Haase, K. Lamprecht, M. Schatzmayr, C. Mitterbauer, F. Hofer, G. Leising, Surf. Sci. 507 - 510, 473 (2002)
27. G. Wantz, L. Hirsch, N. Huby, L. Vignau, J.F. Silvain, A.S. Barriére, J.P. Parneix, Thin Solid Films 485, 247 (2005)
28. J.A. Chaney, S.E. Koh, C.S. Dulcey, P.E. Pehrsson, Appl. Surf. Sci. 218, 258 (2003)
29. V. Christou, M. Etchells, O. Renault, P.J. Dobson, O.V. Salata, G. Beamson, R.G. Egdell, J. Appl. Phys. 88, 5180 (2000)
30. J.S. Kim, R.H. Friend, F. Cacialli, Synth. Met. 111 - 112, 369 (2000)
31. C. Ganzorig, K.-J. Kwak, K. Yagi, M. Fujihira, Appl. Phys. Lett. 79, 272 (2001)
32. D. Lu, Y. Wu, J. Guo, G. Lu, Y. Wang, J. Shen, Mater. Sci. & Eng. B 97, 141 (2003)
33. I-Min Chan, F.C. Hong, Thin Solid Films 444, 254 (2003)
34. R.A. Hatton, S.R. Day, M.A. Chesters, M.R. Willis, Thin Solid Films 394, 292 (2001)
35. S. Jung, N.G. Park, M.Y. Kwak, B.O. Kim, K.H. Choi, Y.J. Cho, Y.K. Kim, Y.S. Kim, Opt. Mater. 21, 235 (2003)
36. K. Sugiyama, H. Ishii, Y. Ouchi, K. Seki, Appl. Phys. Lett. 87, 295 (2000)
37. J.S. Kim, F. Cacialli, A. Cola, G. Gigli, R. Cingolani, Appl. Phys. Lett. 75, 19 (1999)
38. D. Briggs, M.P. Seah, Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy (John Wiley & Sons Ltd., New York, 1983)
39. S. Wu, Polymer Interface and Adhesion (Marcel Dekker, New York, 1982)
40. M. Ishii, T. Mori, H. Fujikawa, S. Tokito, Y. Taga, J. Lumin. 87 - 89, 1165 (2000)
41. Y. Gassenbauer, A. Klein, Solid State Ionics 173, 141 (2004)
42. S.K. So, W.K. Choi, C.H. Cheng, L.M. Leung, C.F. Kwong, Appl. Phys. A 68, 447 (1999)
43. J.S. Kim, P.K.H. Ho, D.S. Thomas, R.H. Friend, F. Cacialli, G.W. Bao, S.F.Y. Li, Chem. Phys. Lett. 315, 307 (1999)
44. C.H. Yi, C.H. Jeong, Y.H. Lee, Y.W. Ko, G.Y. Yeom, Surf. Coat. Technol. 177 - 178, 711 (2004)