Effect of deposition rate on structure and surface morphology of thin evaporated al films on Dielectrics and Semiconductors

Medziagotyra

Volumn 18, Issue 4, 2012, Pages 313-317

  Bordo, Kirill ^a   Rubahn, Horst Günter ^a  

^a UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

Author keywords

Aluminum thin films; Deposition rate; E beam evaporation; Grain size; Surface roughness

Indexed keywords

EID: 84876040193     PISSN: 13921320     EISSN: None     Source Type: Journal    
DOI: 10.5755/j01.ms.18.4.3088     Document Type: Article

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