Fractal dimension, growth mode and residual stress of metal thin films

Journal of Physics D: Applied Physics

Volumn 40, Issue 4, 2007, Pages 1077-1079

  Guisbiers, G ^a   Van Overschelde, O ^a   Wautelet, M ^a   Leclere Ph ^a   Lazzaroni, R ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; FRACTAL DIMENSION; METALLIC FILMS; RESIDUAL STRESSES; SILICON; SURFACE MORPHOLOGY;

GROWTH MODE; INTRINSIC STRESSES; METAL THIN FILMS;

THIN FILMS;

EID: 33947690712     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/4/024     Document Type: Article

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