Structure engineering for hillock-free pure aluminum sputter deposition for gate and source line fabrication in active-matrix liquid crystal displays

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2668-2677

  Voutsas, Apostolos T ^a   Hibino, Yoshi ^a   Pethe, Rajiv ^b   Demaray, Ernest ^b  

^a Sharp Microelectronics Technology Inc Inc   (United States)

^b Applied Komatsu Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032346652     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581398     Document Type: Article

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