Structural, morphological and electronic study of CVD SnO2:Sb films

Materials Chemistry and Physics

Volumn 139, Issue 2-3, 2013, Pages 871-876

  Haireche, S ^a   Boumeddiene, A ^a   Guittoum, A ^b   El Hdiy, A ^c   Boufelfel, A ^d  

^a UNIVERSITY OF BLIDA   (Algeria)

^b CENTRE DE RECHERCHE NUCLÉAIRE D ALGER   (Algeria)

^c UNIVERSITÉ DE REIMS CHAMPAGNE ARDENNE   (France)

^d UNIVERSITY OF GUELMA   (Algeria)

Author keywords

Atomic force microscopy (AFM); Chemical vapour deposition (CVD); Electrical properties; Oxides; Rutherford backscattering spectroscopy (RBS); Thin films

Indexed keywords

CHEMICAL COMPOSITIONS; CHEMICAL VAPOUR DEPOSITION; DOPING CONCENTRATION; ELECTRICAL CONDUCTIVE PROPERTY; ELECTRONIC STUDIES; PREFERRED ORIENTATIONS; ROOM TEMPERATURE; SOLID THIN FILMS;

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; OXIDES; SEMICONDUCTOR DOPING; SURFACE ROUGHNESS; THIN FILMS; VAPORS; X RAY DIFFRACTION; X RAY POWDER DIFFRACTION;

CHEMICAL VAPOR DEPOSITION;

EID: 84875950611     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2013.02.046     Document Type: Article

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