Hydrogen plasma treatment of silicon dioxide for improved silane deposition

Langmuir

Volumn 29, Issue 11, 2013, Pages 3604-3609

  Gupta, Vipul ^a   Madaan, Nitesh ^a   Jensen, David S ^a   Kunzler, Shawn C ^a   Linford, Matthew R ^a  

^a Brigham Young University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; ORGANIC CONTAMINATION; PLASMA TREATMENT; PRINCIPAL COMPONENTS ANALYSIS; SILANE DEPOSITION; SILICON SURFACES; SURFACE FUNCTIONALIZATION;

CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; PLASMAS; PRINCIPAL COMPONENT ANALYSIS; SECONDARY ION MASS SPECTROMETRY; SILANES; SILICA; SPECTROSCOPIC ELLIPSOMETRY; SURFACE CHEMISTRY; SURFACE ROUGHNESS; SURFACE TREATMENT; VOLTAGE DIVIDERS; WETTING;

PLASMA DEPOSITION;

EID: 84875326609     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la304491x     Document Type: Article

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