Subsurface oxidation for micropatterning silicon (SOMS)

Langmuir

Volumn 25, Issue 3, 2009, Pages 1289-1291

  Zhang, Feng ^a,b   Satitter, Ken ^a,b   Davis, Robert C ^a,b   Linford, Matthew R ^a,b  

^a BRIGHAM YOUNG UNIVERSITY   (United States)

^b Yield Engineering Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCES; CHEMISTRY LABORATORIES; MICRO-PATTERNING; OXIDATION PROCESS; OXYGEN PRESSURES; PATTERNING TECHNIQUES; PLASMA GENERATORS; RADIO-FREQUENCY PLASMAS; RATIO FEATURES; REACTION CONDITIONS; SILICON SURFACES; STENCIL MASKS; SUBSURFACE OXIDATIONS;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; OXIDATION; OXYGEN; PLASMAS; SCANNING ELECTRON MICROSCOPY;

OPTICAL MICROSCOPY;

EID: 61849092591     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803408x     Document Type: Article

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