Organic contaminants removal by oxygen ECR plasma

Applied Surface Science

Volumn 253, Issue 7, 2007, Pages 3658-3663

  Lee, Chongmu ^a   Kim, Hyoun Woo ^a   Kim, Sookjoo ^a  

^a Inha University   (South Korea)

Author keywords

ATR FT IR; Dry cleaning; Hydrogen ECR plasma cleaning; Organic contaminant; Oxygen ECR plasma cleaning

Indexed keywords

DETECTORS; IMPURITIES; LEAKAGE CURRENTS; MOS CAPACITORS; PLASMA APPLICATIONS; SILICON WAFERS; SURFACE ROUGHNESS;

HYDROGEN ECR PLASMA CLEANING; ORGANIC CONTAMINANT; OXYGEN ECR PLASMA CLEANING; PLASMA EXPOSURE; WAFER CLEANING APPLICATIONS;

SURFACE CLEANING;

EID: 33846303221     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.07.075     Document Type: Article

References (7)

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7. Private communication with K.W. Kwon, Dept. of M.S. & E., Hanyang University who was peviousely an engineer at Samsung Electronics.