Chemical vapor deposition of three aminosilanes on silicon dioxide: Surface characterization, stability, effects of silane concentration, and cyanine dye adsorption

Langmuir

Volumn 26, Issue 18, 2010, Pages 14648-14654

  Zhang, Feng ^a   Sautter, Ken ^b   Larsen, Adam M ^a   Findley, Daniel A ^a   Davis, Robert C ^a   Samha, Hussein ^c   Linford, Matthew R ^a  

^a Brigham Young University   (United States)

^b Yield Engineering Systems   (United States)

^c SOUTHERN UTAH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3-AMINOPROPYLTRIETHOXYSILANE; AFM IMAGE; AMINE GROUPS; AMINOSILANES; ANALYTICAL TECHNIQUES; AVERAGE SURFACE ROUGHNESS; CONTACT ANGLE GONIOMETRY; COVALENTLY BONDED; CYANINE DYES; ELLIPSOMETRY MEASUREMENTS; GAS-PHASE CONCENTRATION; GOOD STABILITY; LOW PRESSURES; MONOFUNCTIONAL; OPTICAL ABSORPTION MEASUREMENT; SILANE CONCENTRATIONS; SILANOLS; SILICON DIOXIDE; SILICON SUBSTRATES; STABILITY TESTS; SURFACE CHARACTERIZATION; SURFACE COVERAGES; TIME-OF-FLIGHT SECONDARY ION MASS SPECTROSCOPY; TOF SIMS; XPS DATA;

ADSORPTION; AGGLOMERATION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL EQUIPMENT; CHEMICAL STABILITY; CONTACT ANGLE; ELECTRON ENERGY LEVELS; GAS ABSORPTION; MONOLAYERS; ORGANIC COMPOUNDS; SECONDARY ION MASS SPECTROMETRY; SILANES; SILICA; SPECTROSCOPIC ELLIPSOMETRY; SURFACE PROPERTIES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 77956588610     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la102447y     Document Type: Article

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