Impedance and electric modulus study of amorphous TiTaO thin films: Highlight of the interphase effect

Journal of Physics D: Applied Physics

Volumn 46, Issue 6, 2013, Pages

  Rouahi, A ^a,b   Kahouli, A ^a,b   Challali, F ^c   Besland, M P ^d   Vallee C ^e   Yangui, B ^b   Salimy, S ^d   Goullet, A ^d   Sylvestre, A ^a  

^a CNRS   (France)

^b Laboratory of Materials Organization and Properties (LMOP)   (Tunisia)

^c UNIVERSITÉ PARIS 13   (France)

^d UNIVERSITÉ DE NANTES   (France)

^e Joseph Fourier University   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX IMPEDANCE SPECTROSCOPY; DIELECTRIC MODULUS; ELECTRIC MODULUS; ELECTRIC RESPONSE; FUNCTION OF FREQUENCY; HIGH TEMPERATURE; INTERPHASE EFFECT; LOW TEMPERATURES; MAXWELL-WAGNER-SILLARS; NEGATIVE TEMPERATURE COEFFICIENT OF RESISTANCES; RF-MAGNETRON SPUTTERING; TEMPERATURE INCREASE; TIO; WIDE FREQUENCY RANGE;

ACTIVATION ENERGY; MAGNETRON SPUTTERING; POLYMER BLENDS; RELAXATION PROCESSES; TANTALUM OXIDES; THIN FILMS; TITANIUM DIOXIDE;

ELECTRIC PROPERTIES;

EID: 84873824027     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/6/065308     Document Type: Article

References (26)

1. Iternational Roadmap for Semiconductors 2009 RF and Analog/Mixed-Signal Technologies for Wireless Communications (Palo Alto, CA: Semiconductors Industry Association)
2. Baristian Kaynak C, Lukosius M, Costina I, Tillack B, Wenger Ch, Ruhl G and Rushworth S 2010 Microelectron. Eng. 87 2561
3. Atanasova E, Spassov D, Paskaleva A, Georgieva M and Koprinarova J 2008 Thin Solid Films 516 8684
4. Huang C, Cheng C-H, Lee K-T and Liou B-H 2009 J. Electr. Soc. 156 G23
5. Cheng C H, Hsu H H, Chen P C, Liou B H, Chin A and Yeh F S 2010 Solid- State Electron. 54 646
6. Huang C C, Cheng C H, Albert Chin and Chou C P 2007 Electrochem. Solid-State Lett. 10 H287 (Pubitemid 47248542)
7. Lukosius M, Baristiran Kaynak C, Wenger Ch, Ruhl G, Rushworth S and Baumann P 2011 Thin Solid Films 519 3831
8. Martinez R, Kumar A, Palai R, Scott J F and Katiyar R S 2011 J. Phys. D: Appl. Phys. 44 105302
9. Liu G-Z et al 2008 Appl. Phys. Lett. 92 122903 (Pubitemid 351451659)
10. Barik S K, Choudhary R N P and Mahapatra P K 2007 Appl. Phys. A 88 217 (Pubitemid 46753822)
11. Sen S and Choudhary R N P 2007 Appl. Phys. A 87 727 (Pubitemid 46642206)
12. Rouahi A, Kahouli A, Chalali F, Besland M P, Vallée C, Yangui B, Salimy S, Goullet A and Sylvestre A 2012 J. Appl. Phys. 112 094104
13. Wang W C et al 2011 Thin Solid Films 519 5730
14. Lukosius M, Baristiran-Kaynak C, Abrutis A, Skapas M, Kubilius V, Zaumer A, Ruhl G and Wenger Ch 2011 Microelectron. Eng. 88 1529
15. Chiang K C, Lai C H, Chin A (Senior Member, IEEE), Wang T J, Chiu H F, Chen J-R, McAlister S P (Senior Member, IEEE) and Chi C C 2005 IEEE Electron Device Lett. 26 728 (Pubitemid 41488885)
16. Kremer F and Schönhals A (ed) 2003 Broadband Dielectric Spectroscopy (Berlin: Springer)
17. Hammami H, Arous M, Lagache M and Kallel A 2007 J. Alloys Compounds 430 1 (Pubitemid 46209655)
18. Rouahi A, Kahouli A, Sylvestre A and Yangui B 2012 J. Alloys Compounds 529 84
19. Gerhardt R 1994 J. Phys. Chem. Solids 55 1491
20. Jonscher A K 1999 J. Phys. D: Appl. Phys. 32 R57
21. Kao K C 2004 Dielectric Phenomena in Solids (Amsterdam: Elsevier)
22. Dutta A and Sinha T P 2006 J. Phys. Chem. Solids 67 1484 (Pubitemid 44056056)
23. Yang C F 1996 Jpn. J. Appl. Phys. 35 1806
24. Viciosa M T, Dionisio M and Gomez Ribelles J L 2011 Polymer 52 1944
25. Ang C. and Yu Z. 2000 Phys. Rev. B 62 228
26. Wang C C and Zhang L W 2006 Phys. Rev. B 74 024106 (Pubitemid 44061117)