Self-limited grain growth, dielectric, leakage and ferroelectric properties of nanocrystalline BiFeO3 thin films by chemical solution deposition

Acta Materialia

Volumn 61, Issue 5, 2013, Pages 1739-1747

  Tang, Xianwu ^a   Zhu, Xuebin ^a   Dai, Jianming ^a   Sun, Yuping ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

BiFeO3; Dielectric; Ferroelectric; Grain growth; Leakage

Indexed keywords

BIFEO3; CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTION DEPOSITION METHOD; COERCIVE FIELD; CONDUCTION MECHANISM; EXPONENTIAL DECAYS; FERROELECTRIC PROPERTY; FOWLER-NORDHEIM TUNNELING; GROWTH MECHANISMS; HIGH ELECTRIC FIELDS; MICRO-STRAIN; NANOCRYSTALLINES; RELAXATION MODELS; SPACE-CHARGE-LIMITED CURRENT;

DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRIC FIELDS; FERROELECTRIC MATERIALS; FERROELECTRICITY; GRAIN GROWTH; ISOTHERMAL ANNEALING; LEAKAGE (FLUID);

THIN FILMS;

EID: 84873720294     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2012.11.048     Document Type: Article

References (45)

1. J.L. Wang, J.B. Neaton, H. Zheng, V. Nagarajan, and S.B. Ogale Science 299 2003 1719
2. R. Thomas, J.F. Scott, D.N. Bose, and R.S. Katiyar J Phys Condens Matter 22 2010 3201
3. Y.E. Roginskaya, Y.N. Venevtsev, and S.A. Fedulov Sov Phys Crystallogr 23 1966 47
4. S.V. Kiselev, A.N. Kshnyakina, and R.P. Ozerov Sov Phys Solid State 5 1964 2425
5. F. Kubel, and H. Schmid Acta Crystallogr Sect B Struct Sci 46 1990 698
6. G. Catalan, and J.F. Scott Adv Mater 21 2009 2463
7. G.A. Smolensky, V.A. Isupov, and A.I. Agronovskaya Sov Phys Solid State 1 1959 150
8. R.Y. Zheng, X.S. Gao, Z.H. Zhou, and J. Wang J Appl Phys 101 2007 054104
9. Z.X. Cheng, H.Y. Zhao, Y. Du, H. Kimura, K. Ozawa, and X.L. Wang Scr Mater 65 2011 249
10. L. You, N.T. Chua, K. Yao, L. Chen, and J.L. Wang Phys Rev B 80 2009 024105
11. Y.J. Qi, Z.H. Chen, C.W. Huang, and L.H. Wang J Appl Phys 111 2012 104117
12. S.K. Singh, K. Maruyama, and H. Ishiwara Integr Ferroelectr 98 2008 83
13. H. Nanuma, and S. Okamura J Appl Phys 101 09 2007 M103
14. S.K. Singh, H. Ishiwara, and K. Maruyama J Appl Phys 100 2006 064102
15. X.W. Tang, J.M. Dai, and X.B. Zhu J Am Ceram Soc 93 2010 1682
16. X.W. Tang, J.M. Dai, and X.B. Zhu J Am Ceram Soc 95 2012 538
17. R.W. Schwartz Chem Mater 9 1997 2325
18. J. Zarzycki J Sol-Gel Sci Technol 8 1997 17
19. Y. Nakamura, S. Nakamura, and M. Okuyama Jpn J Appl Phys 47 2008 9
20. A.H.M. Gonzalez, A.Z. Simões, and L.S. Cavalcante Appl Phys Lett 90 2007 052906
21. V. Mihalache, and I. Pasuk Acta Mater 59 2011 4875
22. J.L.M. Rupp, A. Infortuna, and L.J. Gauckler Acta Mater 54 2006 1721
23. B. Inham, R. Linklater, and T. Kemmitt J Phys Chem C 115 2011 21034
24. V. Mihalache, and I. Pasuk Acta Mater 59 2011 5875
25. J.E. Burke, and D. Turnbull Prog Metal Phys 3 1952 220
26. E.A. Grey, and G.T. Higgins Acta Metall 21 1973 309
27. A. Michels, C.E. Krill, H. Ehrhardt, R. Birringer, and D.T. Wu Acta Mater 47 1999 2143
28. O.V. Mazurin J Non-Cryst Solids 25 1977 129
29. J.K.L. Lai, C.H. Shek, and G.M. Lin Scr Mater 49 2003 441
30. Z.W. Chen, C.H. Shek, and J.K.L. Lai Appl Phys A 80 2005 703
31. R. Schwartz, T. Schneller, and R. Waser CR Chim 7 2004 433
32. H.S. Chen, J.T. Krause, and E.A. Sigety J Non-Cryst Solids 13 1974 321
33. F. Xu, S.T. McKinstry, W. Ren, B.M. Xu, Z.L. Xie, and K.J. Hemker J Appl Phys 89 2001 1336
34. J. Pérez de la Cruz, E. Joanni, P.M. Vilarinho, and A.L. Kholkin J Appl Phys 108 2010 114106
35. D.B. Sirdeshmukh, L. Sirdeshmukh, and K.G. Subhadra Micro- and Macro-Properties of Solids: Thermal, Mechanical and Dielectric Properties 2006 Springer New York
36. C. Wang, M. Takahashi, H. Fujino, X. Zhao, and E. Kume J Appl Phys 99 2006 054104
37. A. Rose Phys Rev 97 1955 1538
38. X. Qi, J. Dho, R. Tomov, M.G. Blamire, and J.L.M. Driscoll Appl Phys Lett 86 2005 062903
39. K.C. Kao Dielectric Phenomena in Solids 2004 Elsevier/Academic Press San Diego, CA
40. S.M. Sze, and K.K. Ng Physics of Semiconductor Devices 3rd ed. 2007 Wiley New York
41. M. Dawber, K.M. Rabe, and J.F. Scott Rev Mod Phys 77 2005 1083
42. F. Yang, M.O. Lai, L. Liu, and T.J. Zhu J Phys D Appl Phys 44 2011 435302
43. A.K. Tagantsev, and G. Gerra J Appl Phys 100 2006 051607
44. S.B. Ren, C.J. Lu, J.S. Liu, H.M. Shen, and Y.N. Wang Phys Rev B 54 1996 R14337
45. J.F.M. Cillessen, M.W.J. Prins, and R.M. Wolf J Appl Phys 81 1997 2777