Tuning effect of N2 on atmospheric-pressure cold plasma CVD of TiO2 photocatalytic films

Plasma Science and Technology

Volumn 15, Issue 1, 2013, Pages 64-69

  Lanbo, Di ^a   Xiaosong, Li ^a   Tianliang, Zhao ^a   Dalei, Chang ^a   Qianqian, Liu ^a   Aimin, Zhu ^a   Di, Lanbo ^a   Li, Xiaosong ^a   Zhao, Tianliang ^a   Chang, Dalei ^a   Liu, Qianqian ^a   Zhu, Aimin ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Atmospheric pressure cold plasma; Dielectric barrier discharge (DBD); Optical emission spectra (OES); Plasma CVD; TiO2 photocatalytic films

Indexed keywords

COLD PLASMA-CVD; COLD PLASMAS; DIELECTRIC BARRIER DISCHARGES; OPTICAL EMISSION SPECTRA; PARTIAL PRESSURE RATIO; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC FILM; STOICHIOMETRIC RATIO; TIO; TUNING MECHANISM; WORKING GAS;

ATMOSPHERIC PRESSURE; DIELECTRIC DEVICES; EMISSION SPECTROSCOPY; FLOW CONTROL; PHOTOCATALYSIS; PLASMA CVD;

TITANIUM DIOXIDE;

EID: 84873108144     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/15/1/11     Document Type: Article

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