Influence of atmospheric plasma source and gas composition on the properties of deposited siloxane coatings

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Dowling, Denis P ^a   Ramamoorthy, Amsarani ^a   Rahman, Mahfujur ^a   Mooney, Damian A ^a   Don MacElroy, J M ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

Atmospheric plasma jet; Coatings, films; Particulate formation; Reel to reel plasma system; Siloxane coatings

Indexed keywords

ATMOSPHERIC PLASMA JET; ATMOSPHERIC PLASMAS; PARTICULATE FORMATION; PLASMA SYSTEMS; SILOXANE COATINGS;

ATMOSPHERIC COMPOSITION; CHEMICAL VAPOR DEPOSITION; COATINGS; CONTACT ANGLE; FILM GROWTH; LIQUIDS; PHASE INTERFACES; PLASMA ACCELERATORS; PLASMA JETS; PLASMA SOURCES; PLASMA THEORY; REELS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS;

PLASMA DEPOSITION;

EID: 77951786678     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931110     Document Type: Conference Paper

References (29)

1. S. Kanazawa, M. Kogoma, T. Moriwaki, S. Okazaki, J. Phys. D: Appl. Phys. 1988, 21, 838.
2. K. S. Szalowski, Z. R. Boroch, J. Sentek, Z. Rymuza, Z. Kusznierewicz, M. Misiak, Plasmas Polym. 2000, 5,173.
3. R. Thyen, A. Weber, C.-P. Klages, Surf. Coat Technol. 1997, 97, 426.
4. F. Massines, N. Gherardi, A. Fornelli, S. Martin, Surf Coat Technol. 2005, 200, 1855.
5. T. P. Kasih, S. Kuroda, H. Kubota, Chem. Vap. Depos. 2007, 13, 169.
6. Y. Sawada, S. Ogawa, M. Kogoma, J. Phys. D: Appl. Phys. 1995, 28, 1661.
7. R. Foest, F. Adler, F. Sigeneger, M. Schmidt, Surf. Coat. Technol. 2003, 163-164, 323.
8. L. J. Ward, W. C. E. Schofield, J. P. S. Badyal, A. J. Goodwin, P. J. Merlin, Langmuir 2003, 19, 2110.
9. S. E. Babayan, J. Y. Jeong, V. J. Tu, J. Park, G. S. Selwyn, R. F. Hicks, Plasma Sourc. Sci. Technol. 1998, 7, 286.
10. L. O'Neill, N. Shephard, S. Leadley, J. Adhes. 2008, 84, 562.
11. J. Albaugh, C. O'Sullivan, L. O'Neill, Surf. Coat Technol. 2008, 203, 844.
12. L. O' Neill, L.-A. O' Hare, S. R. Leadley, A. J. Goodwin, Chem. Vap. Depos. 2005, 11, 477.
13. B. Twomey, D. Dowling, G. Byrne, L. O'Neill, L-A. O'Hare, Plasma Process. Polym. 2007, 4, S450.
14. B. Twomey, M. Rahman, G. Byrne, A. Hynes, L.-A. O'Hare, L. O' Neill, D. Dowling, Plasma Process. Polym, 2008, 5, 737.
15. M. Adachi, K. Okuyama, N. Tohge, M. Shimada, J. Satoh, M. Muroyama, Jpn. J. Appl. Phys. 1992, 31, L1439.
16. M. Adachi, K. Okuyama, N. Tohge, J. Mater. Sci. 1995, 30, 932.
17. T. Fujimoto, K. Okuyama, M. Shimada, Y. Fujishige, M. Adachi, I. Matsui, J. Appl. Phys. 2000, 88, 3047.
18. M. Shiratani, T. Fukuzawa, Y. Wattababe, IEEE, Trans. Plasma Sci. 1994, 22, 103.
19. J. A. Woollam, B. Johs, C. M. Herzinger, J. N. Hilfiker, R. Synowicki, C. Bungay, 1999, SPIE Proč. CR72, 3.
20. Digimizer software, Copy right: 2005-2007, Frank Schoonjans, http://www.digimizer.com.
21. L-A. O' Hare, B. Parbhoo, S. R. Leadley, Surf. Interface Anal. 2004, 36, 1427.
22. A. Pfuch, A. Heft, R. Weidl, K. Lang, Surf. Coat Technol. 2006, 201, 189.
23. R. Amsarani, M. Rahman, D. A. Mooney, J. M. D. MacElroy, D. P. Dowling, Plasma Process. Polym. 2008, DOI:10.1002/ ppap.200931109.
24. M. Rahman, R. Amsarani, D. A. Mooney, J. M. D. MacElroy, D. P. Dowling, J. Nanosci. Nanotechnol 2008, DOI:10.1166/ jnn.2008.SBN24.
25. B. Twomey, G. Byrne, D. Dowling, B. Graham, L. Schaper, D. Delia Croce, A. Hynes, L. O'Neill, IEEE T. Plasma Sci. 2009, DOI: 10.1109/TPS.2009.2015226.
26. F. Massines, G. Gouda, J. Phys. D: Appl. Phys. 1998, 31, 3411.
27. V. I. Arkhipenko, A. A. Kirillov, L. V. Simonchik, S. M. Zgirouski, Plasma Sourc. Sci. Technol. 2005, 14, 757.
28. Y.-H. Lee, S.-J. Kyung, C-H. Jeong, G.-Y. Yeomy, Jpn. J. Appl. Phys. 2005, 44, L78.
29. A. Sonnenfeld, J. F. Behnke, K. V. Kozlov, American Physical Society, 53rd Annual Gaseous Electronics Conference October 24-27, 2000 Houston, Texas Meeting ID: GECOO, abstract #WP.034.