-
1
-
-
4143101020
-
Plasma enhanced chemical vapour deposition of thin films for microelectronics
-
J. J. C. S. M. Rossnagel, W. D. Westwood, Eds., William Andrew Publishing, Noyes
-
R. Reif, "Plasma Enhanced Chemical Vapour Deposition of Thin Films for Microelectronics" in: Handbook of Plasma Processing Technology - Fundamentals, Etching, Deposition, and Surface Interactions, J. J. C. S. M. Rossnagel, W. D. Westwood, Eds., William Andrew Publishing, Noyes 1990, p. 260.
-
(1990)
Handbook of Plasma Processing Technology - Fundamentals, Etching, Deposition, and Surface Interactions
, pp. 260
-
-
Reif, R.1
-
4
-
-
1342331897
-
-
S. Martin, F. Massines, N. Gherardi, C. Jimenez, Surf. Coat. Technol. 2004, 177, 693.
-
(2004)
Surf. Coat. Technol.
, vol.177
, pp. 693
-
-
Martin, S.1
Massines, F.2
Gherardi, N.3
Jimenez, C.4
-
5
-
-
0037472671
-
-
R. Foest, F. Adler, F. Sigeneger, M. Schmidt, Surf. Coat. Technol. 2003, 163, 323.
-
(2003)
Surf. Coat. Technol.
, vol.163
, pp. 323
-
-
Foest, R.1
Adler, F.2
Sigeneger, F.3
Schmidt, M.4
-
6
-
-
0037023121
-
-
A. Bogaerts, E. Neyts, R. Gijbels, J. van der Mullen, Spectrochim. Acta Part B 2002, 57, 609.
-
(2002)
Spectrochim. Acta Part B
, vol.57
, pp. 609
-
-
Bogaerts, A.1
Neyts, E.2
Gijbels, R.3
Van Der Mullen, J.4
-
7
-
-
4644316900
-
-
F. Massines, P. Segur, N. Gherardi, C. Khamphan, A. Ricard, Surf. Coat. Technol. 2003, 174-175, 8.
-
(2003)
Surf. Coat. Technol.
, vol.174-175
, pp. 8
-
-
Massines, F.1
Segur, P.2
Gherardi, N.3
Khamphan, C.4
Ricard, A.5
-
8
-
-
0031388580
-
-
R. Thyen, A. Weber, C. P. Klages, Surf. Coat. Technol. 1997, 97, 426.
-
(1997)
Surf. Coat. Technol.
, vol.97
, pp. 426
-
-
Thyen, R.1
Weber, A.2
Klages, C.P.3
-
9
-
-
33750319968
-
-
J. L. Hodgkinson, D. W. Sheel, H. M. Yates, M. E. Pemble, Plasma Process. Polym. 2006, 3, 597.
-
(2006)
Plasma Process. Polym.
, vol.3
, pp. 597
-
-
Hodgkinson, J.L.1
Sheel, D.W.2
Yates, H.M.3
Pemble, M.E.4
-
10
-
-
31744432810
-
-
J. L. Hodgkinson, D. W. Sheel, H. M. Yates, M. E. Pemble, M. J. Davis, Proc. Electrochem. Soc. 2005, 2005-9, 889.
-
(2005)
Proc. Electrochem. Soc.
, vol.2005-2009
, pp. 889
-
-
Hodgkinson, J.L.1
Sheel, D.W.2
Yates, H.M.3
Pemble, M.E.4
Davis, M.J.5
-
13
-
-
33644771337
-
-
H. M. Yates, M. G. Nolan, D. W. Sheel, M. E. Pemble, J. Photochem. Photobiol. A 2006, 179, 213.
-
(2006)
J. Photochem. Photobiol. A
, vol.179
, pp. 213
-
-
Yates, H.M.1
Nolan, M.G.2
Sheel, D.W.3
Pemble, M.E.4
-
14
-
-
2442700491
-
-
C. H. Kwon, H. Shin, J. H. Kim, W. S. Choi, K. H. Yoon, Mater. Chem. Phys. 2004, 86, 78.
-
(2004)
Mater. Chem. Phys.
, vol.86
, pp. 78
-
-
Kwon, C.H.1
Shin, H.2
Kim, J.H.3
Choi, W.S.4
Yoon, K.H.5
-
15
-
-
2442464661
-
-
T. Nuida, N. Kanai, K. Hashimoto, T. Watanabe, H. Ohsaki, Vacuum 2004, 74, 729.
-
(2004)
Vacuum
, vol.74
, pp. 729
-
-
Nuida, T.1
Kanai, N.2
Hashimoto, K.3
Watanabe, T.4
Ohsaki, H.5
-
16
-
-
1542335381
-
-
B.-H. Kim, J.-Y. Lee, Y.-H. Choa, M. Higuchi, N. Mizutani, Mater. Sci. Eng. B 2004, 107, 289.
-
(2004)
Mater. Sci. Eng. B
, vol.107
, pp. 289
-
-
Kim, B.-H.1
Lee, J.-Y.2
Choa, Y.-H.3
Higuchi, M.4
Mizutani, N.5
-
17
-
-
0037457552
-
-
A. Sandell, M. P. Andersson, M. K.-J. Johansson, P. G. Karlsson, Y. Alfredsson, J. Schnadt, H. Siegbahn, P. Uvdal, Surf. Sci. 2003, 530, 63.
-
(2003)
Surf. Sci.
, vol.530
, pp. 63
-
-
Sandell, A.1
Andersson, M.P.2
Johansson, M.K.-J.3
Karlsson, P.G.4
Alfredsson, Y.5
Schnadt, J.6
Siegbahn, H.7
Uvdal, P.8
-
18
-
-
0041302194
-
-
A. Mills, G. Hill, S. Bhopal, I. P. Parkin, S. A. O'Neill, J. Photochem. Photobiol. A 2003, 160, 185.
-
(2003)
J. Photochem. Photobiol. A
, vol.160
, pp. 185
-
-
Mills, A.1
Hill, G.2
Bhopal, S.3
Parkin, I.P.4
O'Neill, S.A.5
-
19
-
-
0034511467
-
-
E. Halary, E. Haro-Poniatowski, G. Benvenuti, P. Hoffmann, Appl. Surf. Sci. 2000, 168, 61.
-
(2000)
Appl. Surf. Sci.
, vol.168
, pp. 61
-
-
Halary, E.1
Haro-Poniatowski, E.2
Benvenuti, G.3
Hoffmann, P.4
-
20
-
-
17344389296
-
-
E. Halary-Wagner, E. T. Bret, A. Brioude, P. Hoffmann, Microelectron. Eng. 2004, 73, 289.
-
(2004)
Microelectron. Eng.
, vol.73
, pp. 289
-
-
Halary-Wagner, E.1
Bret, E.T.2
Brioude, A.3
Hoffmann, P.4
-
21
-
-
33750319968
-
-
J. Hodgkinson, D. W. Sheel, H. M. Yates, M. E. Pemble, Plasma Process. Polym. 2006, 3, 597.
-
(2006)
Plasma Process. Polym.
, vol.3
, pp. 597
-
-
Hodgkinson, J.1
Sheel, D.W.2
Yates, H.M.3
Pemble, M.E.4
-
22
-
-
33644771337
-
-
H. M. Yates, M. G. Nolan, D. W. Sheel, M. E. Pemble, J. Photochem. Photobiol. A 2006, 179, 213.
-
(2006)
J. Photochem. Photobiol. A
, vol.179
, pp. 213
-
-
Yates, H.M.1
Nolan, M.G.2
Sheel, D.W.3
Pemble, M.E.4
-
23
-
-
0029408455
-
-
Y. Paz, Z. Luo, L. Rabenberg, A. Heller, J. Mater. Res. 1995, 10, 2842.
-
(1995)
J. Mater. Res.
, vol.10
, pp. 2842
-
-
Paz, Y.1
Luo, Z.2
Rabenberg, L.3
Heller, A.4
-
24
-
-
0003708256
-
-
J. Chastain, R. C. King, Eds., Physical Electronic Inc, New York
-
Handbook of X-Ray Photoelectron Spectroscopy, J. Chastain, R. C. King, Eds., Physical Electronic Inc, New York 1995.
-
(1995)
Handbook of X-Ray Photoelectron Spectroscopy
-
-
-
25
-
-
0036973854
-
-
Y. J. Sun, T. Egawa, L. Y. Zhang, X. Yao, Jpn. J. Appl. Phys. 2002, 41, L1389.
-
(2002)
Jpn. J. Appl. Phys.
, vol.41
-
-
Sun, Y.J.1
Egawa, T.2
Zhang, L.Y.3
Yao, X.4
-
26
-
-
0344493834
-
-
X. Y. Li, X. Quan, C. Kutal, Scripta Mat. 2004, 50, 499.
-
(2004)
Scripta Mat.
, vol.50
, pp. 499
-
-
Li, X.Y.1
Quan, X.2
Kutal, C.3
-
27
-
-
0036639418
-
-
J. Guillot, A. Jouaiti, B. Domenichini, O. Heintz, S. Zerkout, A. Mosser, S. Bourgeois, Surf. Interface Anal. 2002, 34, 577.
-
(2002)
Surf. Interface Anal.
, vol.34
, pp. 577
-
-
Guillot, J.1
Jouaiti, A.2
Domenichini, B.3
Heintz, O.4
Zerkout, S.5
Mosser, A.6
Bourgeois, S.7
-
29
-
-
0003427458
-
-
B. D. Cullity, Ed., AddisonWesley
-
Elements of X-Ray Diffraction, B. D. Cullity, Ed., AddisonWesley, 1978.
-
(1978)
Elements of X-Ray Diffraction
-
-
-
31
-
-
33846875867
-
-
L. A. Brook, P. Evans, H. A. Foster, M. E. Pemble, A. Steele, D. W. Sheel, H. M. Yates, J. Photochem. Photobiol. A 2007, 187, 53.
-
(2007)
J. Photochem. Photobiol. A
, vol.187
, pp. 53
-
-
Brook, L.A.1
Evans, P.2
Foster, H.A.3
Pemble, M.E.4
Steele, A.5
Sheel, D.W.6
Yates, H.M.7
-
32
-
-
31744442638
-
-
H. M. Yates, M. G. Nolan, D. W. Sheel, M. E. Pemble, Proc. Electrochem. Soc. 2005, 2005-09, 783.
-
(2005)
Proc. Electrochem. Soc.
, vol.2005-2009
, pp. 783
-
-
Yates, H.M.1
Nolan, M.G.2
Sheel, D.W.3
Pemble, M.E.4
-
33
-
-
33947329965
-
-
P. Evans, T. English, D. Hammond, M. E. Pemble, D. W. Sheel, Appl. Cat. A 2007, 321, 140.
-
(2007)
Appl. Cat. A
, vol.321
, pp. 140
-
-
Evans, P.1
English, T.2
Hammond, D.3
Pemble, M.E.4
Sheel, D.W.5
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