메뉴 건너뛰기




Volumn 21, Issue 1, 2013, Pages 867-876

Low-voltage broad-band electroabsorption from thin Ge/SiGe quantum wells epitaxially grown on silicon

Author keywords

[No Author keywords available]

Indexed keywords

WAVEGUIDES;

EID: 84872735929     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.000867     Document Type: Article
Times cited : (52)

References (29)
  • 10
    • 79251534735 scopus 로고    scopus 로고
    • Room temperature photoluminescence of Ge multiple quantum wells with Ge-rich barriers
    • E. Gatti, E. Grilli, M. Guzzi, D. Chrastina, G. Isella, and H. von Kanel, "Room temperature photoluminescence of Ge multiple quantum wells with Ge-rich barriers," Appl. Phys. Lett. 98, 031106 (2011).
    • (2011) Appl. Phys. Lett. , vol.98 , pp. 031106
    • Gatti, E.1    Grilli, E.2    Guzzi, M.3    Chrastina, D.4    Isella, G.5    Von Kanel, H.6
  • 11
    • 67449128189 scopus 로고    scopus 로고
    • Device requirements for optical interconnects to silicon chips
    • D. A. B. Miller, "Device requirements for optical interconnects to silicon chips," Proc. IEEE 97, 1166-1185 (2009).
    • (2009) Proc. IEEE , vol.97 , pp. 1166-1185
    • Miller, D.A.B.1
  • 12
    • 84858976304 scopus 로고    scopus 로고
    • Energy consumption in optical modulators for interconnects
    • D. A. B. Miller, "Energy consumption in optical modulators for interconnects," Opt. Express 20, A293-A308 (2012).
    • (2012) Opt. Express , vol.20
    • Miller, D.A.B.1
  • 15
    • 27644490697 scopus 로고    scopus 로고
    • Strong quantumconfined stark effect in germanium quantum well structures on silicon
    • Y. H. Kuo, Y. K. Lee, Y. Ge, S. Ren, J. E. Roth, T. I. Kamins, D. A. B. Miller, and J. S. Harris, "Strong quantumconfined stark effect in germanium quantum well structures on silicon," Nature 437, 1334-1336 (2005).
    • (2005) Nature , vol.437 , pp. 1334-1336
    • Kuo, Y.H.1    Lee, Y.K.2    Ge, Y.3    Ren, S.4    Roth, J.E.5    Kamins, T.I.6    Miller, D.A.B.7    Harris, J.S.8
  • 16
    • 0009594704 scopus 로고    scopus 로고
    • Correlation between leakage current density and threading dislocation density in SiGe p-i-n diodes grown on relaxed graded buffer layers
    • L. M. Giovane, H. Luan, A. M. Agarwal, and L. C. Kimerling, "Correlation between leakage current density and threading dislocation density in SiGe p-i-n diodes grown on relaxed graded buffer layers," Appl. Phys. Lett. 78, 541-543 (2001).
    • (2001) Appl. Phys. Lett. , vol.78 , pp. 541-543
    • Giovane, L.M.1    Luan, H.2    Agarwal, A.M.3    Kimerling, L.C.4
  • 20
    • 22944463353 scopus 로고    scopus 로고
    • Strain-induced enhancement of near-infrared absorption in Ge epitaxial layers grown on Si substrate
    • Y. Ishikawa, K. Wada, J. Liu, D. D. Cannon, H.-C. Luan, J. Michel, and L. C. Kimerling, "Strain-induced enhancement of near-infrared absorption in Ge epitaxial layers grown on Si substrate," J. of Appl. Phys. 98, 013501 (2005).
    • (2005) J. of Appl. Phys. , vol.98 , pp. 013501
    • Ishikawa, Y.1    Wada, K.2    Liu, J.3    Cannon, D.D.4    Luan, H.-C.5    Michel, J.6    Kimerling, L.C.7
  • 26
    • 78649378380 scopus 로고    scopus 로고
    • Design of Ge/SiGe quantum-confined Stark effect electroabsorption heterostructures for CMOS compatible photonics
    • L. Lever, Z. Ikonic, A. Valavanis, J. Cooper, and R. Kelsall, "Design of Ge/SiGe quantum-confined Stark effect electroabsorption heterostructures for CMOS compatible photonics," J. Lightwave Tech. 28, 3273-3281 (2010).
    • (2010) J. Lightwave Tech. , vol.28 , pp. 3273-3281
    • Lever, L.1    Ikonic, Z.2    Valavanis, A.3    Cooper, J.4    Kelsall, R.5
  • 28
    • 84894400873 scopus 로고    scopus 로고
    • "www.photond.com," (2012).
    • (2012)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.