A sandwiched flexible polymer mold for control of particle-induced defects in nanoimprint lithography

Applied Physics A: Materials Science and Processing

Volumn 110, Issue 1, 2013, Pages 123-128

  Li, Bin ^a   Zhang, Jizong ^b   Ge, Haixiong ^b  

^a AFFILIATED ZHONGDA HOSPITAL OF SOUTHEAST UNIVERSITY   (China)

^b NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAY SURFACE; BACKPLANES; CUSHION LAYERS; DEFECTIVITY; DIFFERENT GEOMETRY; EPOXY-SILOXANE; EXTERNAL PRESSURES; FLEXIBLE POLYMERS; HIGH RESISTANCE; HIGH TRANSPARENCY; OXYGEN PLASMAS; PDMS SURFACES; PITCH GRATING; UV-CURING;

CURING; ELASTICITY; MICROCHANNELS; MOLDS; NANOIMPRINT LITHOGRAPHY; OXYGEN;

POLYETHYLENE TEREPHTHALATES;

EID: 84872304751     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-012-7334-3     Document Type: Article

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