SCOPUS 정보 검색 플랫폼

Volumn 23, Issue 6, 2005, Pages 2933-2938

Defect control in nanoimprint lithography

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT CONTROL; DRY CLEAN PROCESS; NANOIMPRINT LITHOGRAPHY (NIL); NANOSTRUCTURED-PATTERNED SURFACES;

DEFECTS; MICROELECTRONICS; MOLDS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SUBSTRATES; VACUUM TECHNOLOGY;

LITHOGRAPHY;

EID: 29044438014 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2130352 Document Type: Article

Times cited : (32)

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