Nondestructive and nonpreparative chemical nanometrology of internal material interfaces at tunable high information depths

Analytical Chemistry

Volumn 85, Issue 1, 2013, Pages 193-200

  Pollakowski, Beatrix ^a   Hoffmann, Peter ^b   Kosinova, Marina ^c   Baake, Olaf ^b   Trunova, Valentina ^c   Unterumsberger, Rainer ^a   Ensinger, Wolfgang ^b   Beckhoff, Burkhard ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^c NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX STRUCTURE; DESTRUCTIVE TECHNIQUES; GRAZING INCIDENCE; INFORMATION DEPTH; INTERNAL INTERFACES; ION MASS SPECTROMETRY; LIGHT ELEMENTS; MATERIAL INTERFACES; MEASUREMENT STRATEGIES; NANO SCALE; NANO-SCALED DEVICES; NANOMETROLOGY; NANOSCALED; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURES; NI METAL; NON DESTRUCTIVE; NONDESTRUCTIVE CHARACTERIZATION; NOVEL MATERIALS; NOVEL METHODS; PHYSICAL CHARACTERIZATION; SILICON SUBSTRATES; TECHNOLOGICAL PROCESS; X RAY FLUORESCENCE;

CHEMICAL ELEMENTS; CHEMICAL PROPERTIES; CHEMICAL VAPOR DEPOSITION; DEPOSITS; MASS SPECTROMETRY; MODEL STRUCTURES; NONDESTRUCTIVE EXAMINATION; PHOTOELECTRONS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 84871761800     PISSN: 00032700     EISSN: 15206882     Source Type: Journal    
DOI: 10.1021/ac3024872     Document Type: Article

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