Investigation of silicon-based nanostructure morphology and chemical termination on laser desorption ionization mass spectrometry performance

Analytical Chemistry

Volumn 84, Issue 24, 2012, Pages 10637-10644

  Dupré, Mathieu ^a   Enjalbal, Christine ^a   Cantel, Sonia ^a   Martinez, Jean ^a   Megouda, Nacéra ^b,c   Hadjersi, Toufik ^c   Boukherroub, Rabah ^b   Coffinier, Yannick ^b  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b CNRS   (France)

^c L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING METHOD; FUNCTIONALIZATIONS; LASER DESORPTION IONIZATION MASS SPECTROMETRY; NANO-STRUCTURED; NANO-STRUCTURED LAYER; NANOSTRUCTURE MORPHOLOGIES; NANOSTRUCTURED SILICON; PEPTIDE IONIZATION; PEPTIDE SOLUTIONS; SIGNAL INTENSITIES; SILICON-BASED; TARGET PLATES; TRYPTIC DIGESTS; VAPOR-LIQUID-SOLID GROWTH;

HYDROCARBONS; IONIZATION; LASERS; MORPHOLOGY; ORGANIC COATINGS; PEPTIDES; SILICON; VAPORS;

MASS SPECTROMETRY;

NANOMATERIAL; SILICON;

ARTICLE; CHEMISTRY; MASS SPECTROMETRY; METHODOLOGY;

NANOSTRUCTURES; SILICON; SPECTROMETRY, MASS, MATRIX-ASSISTED LASER DESORPTION-IONIZATION;

EID: 84871309240     PISSN: 00032700     EISSN: 15206882     Source Type: Journal    
DOI: 10.1021/ac3021104     Document Type: Article

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