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41849151882
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Superhydrophobic silicon nanowire surfaces were obtained by chemical functionalization of the native oxide with a 10-3 M octadecyltrichlorosilane solution in hexane for 16 h at room temperature in a dry-nitrogen-purged glovebox. The resulting surface was rinsed with CHCl 3 and i-PrOH and dried in a gentle stream of nitrogen
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3 and i-PrOH and dried in a gentle stream of nitrogen.
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41849110724
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2 plasma etch for 30 s. Finally, the resist was removed with acetone, and the sample was further cleaned in acetone, isopropyl alcohol, and deionized water.
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2 plasma etch for 30 s. Finally, the resist was removed with acetone, and the sample was further cleaned in acetone, isopropyl alcohol, and deionized water.
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41849125059
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Array imaging was performed using the Cy3 channel of an Affymetrix 418 array scanner at a resolution of 10 μm.
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Array imaging was performed using the Cy3 channel of an Affymetrix 418 array scanner at a resolution of 10 μm.
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41849130793
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The oxide patterns were amine-terminated by reaction with 3% aminopropyltriethoxysilane (APTES) in 95/5 v/v memanol/water for 1 h under stirring. The resulting surfaces were washed with methanol (two times) and isopropanol and then dried in a gentle stream of nitrogen.
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The oxide patterns were amine-terminated by reaction with 3% aminopropyltriethoxysilane (APTES) in 95/5 v/v memanol/water for 1 h under stirring. The resulting surfaces were washed with methanol (two times) and isopropanol and then dried in a gentle stream of nitrogen.
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