Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Journal of Physics D: Applied Physics

Volumn 45, Issue 49, 2012, Pages

  Bayraktar, Muharrem ^a   Wessels, Werner A ^a   Lee, Chris J ^b   Van Goor, Fred A ^a   Koster, Gertjan ^a   Rijnders, Guus ^a   Bijkerk, Fred ^a,b  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b DUTCH INSTITUTE FOR FUNDAMENTAL ENERGY RESEARCH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; DESIGN AND OPTIMIZATION; EXTREME ULTRAVIOLETS; MIRROR STRUCTURE; MULTI-LAYER MIRRORS; MULTILAYER STRUCTURES; PIEZOELECTRIC COEFFICIENT; PIEZOELECTRIC LAYERS; PIEZOELECTRIC THIN FILMS; REFLECTANCE CHANGES;

DEPOSITION; MIRRORS; MULTILAYERS; PIEZOELECTRICITY; REFLECTION;

FILM PREPARATION;

EID: 84870208559     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/49/494001     Document Type: Article

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