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Volumn 89, Issue 1, 2011, Pages 19-26

Gas-phase reaction chemistry of 1,1-dimethyl-1-silacyclobutane as a precursor gas in the hot-wire chemical vapor deposition processFormation of tetramethylsilane and trimethylsilane

Author keywords

1,1 dimethyl 1 silacyclobutane; gas phase reaction chemistry; hot wire chemical vapour deposition; silene; silylene; vacuum UV laser single photon ionization mass spectrometry

Indexed keywords

GAS-PHASE REACTION CHEMISTRY; HOT-WIRE CHEMICAL VAPOUR DEPOSITION; SILACYCLOBUTANE; SILENE; SILYLENES; VACUUM UV LASER SINGLE PHOTON IONIZATION MASS SPECTROMETRY;

EID: 79251613414     PISSN: 00084042     EISSN: None     Source Type: Journal    
DOI: 10.1139/V10-147     Document Type: Article
Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.