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Volumn 108, Issue , 2013, Pages 180-188

Electrical, optical and structural investigation of plasma-enhanced chemical-vapor-deposited amorphous silicon oxynitride films for solar cell applications

Author keywords

Amorphous silicon oxynitride; Surface passivation; Wide band gap heterojunctions

Indexed keywords

A-SI:H; ABSORBANCES; AMORPHOUS NETWORKS; CRYSTALLINE SI; DARK CONDUCTIVITY; DEPOSITION PARAMETERS; DOPED FILMS; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; FTIR; LOW TEMPERATURES; MINORITY CARRIER LIFETIMES; N-TYPE DOPING; NITROGEN CONCENTRATIONS; NITROUS OXIDE; P-TYPE DOPING; PHOTOVOLTAIC APPLICATIONS; PLASMA DECOMPOSITION; SI-O-SI BOND; SILICON OXYNITRIDE FILMS; SILICON OXYNITRIDES; SOLAR-CELL APPLICATIONS; SPECTRAL ELLIPSOMETRY; STRUCTURAL INVESTIGATION; SURFACE PASSIVATION; TEMPERATURE-DEPENDENT CONDUCTIVITY; WIDE BAND GAP;

EID: 84867591838     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2012.09.025     Document Type: Conference Paper
Times cited : (29)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.