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Journal of Non-Crystalline Solids

Volumn 195, Issue 1-2, 1996, Pages 72-75

A structural interpretation of Si-O-Si vibrational absorption of high-photoconductive amorphous a-SiOx.:H films

(2) Haga, K a Watanabe, H a

a SENDAI NATIONAL COLLEGE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS ALLOYS; CARBON DIOXIDE; DECOMPOSITION; GLOW DISCHARGES; INFRARED SPECTROSCOPY; MIXTURES; OXYGEN; PHOTOCONDUCTING MATERIALS; PHOTOCONDUCTIVITY; SILANES; SILICON;

HYDROGENATED AMORPHOUS SILICON OXYGEN ALLOY FILMS; TWO PHASE STRUCTURE MODEL; VIBRATIONAL ABSORPTION;

AMORPHOUS FILMS;

EID: 0030562367 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/0022-3093(95)00544-7 Document Type: Article

Times cited : (48)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.