Atomic force microscopy probes with integrated boron doped diamond electrodes: Fabrication and application

Electrochemistry Communications

Volumn 25, Issue 1, 2012, Pages 30-34

  Eifert, Alexander ^a   Smirnov, Waldemar ^b   Frittmann, Stefan ^a   Nebel, Christoph ^b   Mizaikoff, Boris ^a   Kranz, Christine ^a  

^a UNIVERSITY OF ULM   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

AFM tip integrated electrode; Boron doped diamond electrode; Combined atomic force scanning electrochemical microscopy

Indexed keywords

AFM; AFM PROBE; BORON DOPED DIAMOND; BORON-DOPED DIAMOND ELECTRODES; CURRENT IMAGING; DIFFUSION PROFILES; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL MICROSCOPY; ELECTROCHEMICAL SURFACES; FIB MILLING; INTEGRATED ELECTRODES; SURFACE TERMINATION;

ATOMIC FORCE MICROSCOPY; ELECTROCHEMICAL ELECTRODES; HYDROGEN; NANOPROBES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROBES; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES;

DIAMONDS;

EID: 84866850627     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2012.09.011     Document Type: Article

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